Reference Type | Journal (article/letter/editorial) |
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Title | Sputtering power and deposition pressure effects on the electrical and structural properties of copper thin films |
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Journal | Journal of Materials Science |
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Authors | Chan, Kah-Yoong | Author |
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Teo, Bee-San | Author |
Year | 2005 (November) | Volume | 40 |
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Publisher | Springer Science and Business Media LLC |
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DOI | doi:10.1007/s10853-005-1362-8Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 10003413 | Long-form Identifier | mindat:1:5:10003413:8 |
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GUID | 0 |
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Full Reference | Chan, Kah-Yoong, Teo, Bee-San (2005) Sputtering power and deposition pressure effects on the electrical and structural properties of copper thin films. Journal of Materials Science, 40. 5971-5981 doi:10.1007/s10853-005-1362-8 |
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Plain Text | Chan, Kah-Yoong, Teo, Bee-San (2005) Sputtering power and deposition pressure effects on the electrical and structural properties of copper thin films. Journal of Materials Science, 40. 5971-5981 doi:10.1007/s10853-005-1362-8 |
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In | (n.d.) Journal of Materials Science Vol. 40. Springer Science and Business Media LLC |
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