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Tian, Xiubo, Fu, Ricky K.Y., Wang, Lianwei, Chu, Paul K. (2001) Oxygen-induced nickel segregation in nitrogen plasma implanted AISI 304 stainless steel. Materials Science and Engineering: A, 316. 200-204 doi:10.1016/s0921-5093(01)01245-x

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Reference TypeJournal (article/letter/editorial)
TitleOxygen-induced nickel segregation in nitrogen plasma implanted AISI 304 stainless steel
JournalMaterials Science and Engineering: A
AuthorsTian, XiuboAuthor
Fu, Ricky K.Y.Author
Wang, LianweiAuthor
Chu, Paul K.Author
Year2001 (November)Volume316
PublisherElsevier BV
DOIdoi:10.1016/s0921-5093(01)01245-xSearch in ResearchGate
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Mindat Ref. ID10028513Long-form Identifiermindat:1:5:10028513:4
GUID0
Full ReferenceTian, Xiubo, Fu, Ricky K.Y., Wang, Lianwei, Chu, Paul K. (2001) Oxygen-induced nickel segregation in nitrogen plasma implanted AISI 304 stainless steel. Materials Science and Engineering: A, 316. 200-204 doi:10.1016/s0921-5093(01)01245-x
Plain TextTian, Xiubo, Fu, Ricky K.Y., Wang, Lianwei, Chu, Paul K. (2001) Oxygen-induced nickel segregation in nitrogen plasma implanted AISI 304 stainless steel. Materials Science and Engineering: A, 316. 200-204 doi:10.1016/s0921-5093(01)01245-x
In(n.d.) Materials Science and Engineering: A Vol. 316. Elsevier BV

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Kim, Sung-Il, Yoo, Yeon-Chul (2001) Dynamic recrystallization behavior of AISI 304 stainless steel. Materials Science and Engineering: A, 311. 108-113 doi:10.1016/s0921-5093(01)00917-0
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Wan, G.J., Huang, N., Yang, P., Fu, Ricky K.Y., Ho, Joan P.Y., Xie, X., Zhou, H.F., Chu, Paul K. (2007) Platelet activation behavior on nitrogen plasma-implanted silicon. Materials Science and Engineering: C, 27. 928-932 doi:10.1016/j.msec.2006.11.005
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Huang, Yongxian, Tian, Xiubo, Lv, Shixiong, Fu, Ricky K.Y., Chu, Paul K. (2012) Mechanical and optical characteristics of multilayer inorganic films on polyimide for anti-atomic-oxygen erosion. Applied Surface Science, 258. 5810-5814 doi:10.1016/j.apsusc.2012.02.104
Tian, Xiubo, Fu, Ricky K.Y., Chen, Junying, Chu, Paul K., Brown, Ian G. (2002) Charging of dielectric substrate materials during plasma immersion ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 187 (4). 485-491 doi:10.1016/s0168-583x(01)01154-5
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