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OSADA, A., DANZINGER, M., HAUBNER, R., LUX, B. (1991) GRAIN REFINEMENT OF CVD TiC LAYERS BY AlCl3, ZrCl4 AND BCl3 IMPURITIES. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991266

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Reference TypeJournal (article/letter/editorial)
TitleGRAIN REFINEMENT OF CVD TiC LAYERS BY AlCl3, ZrCl4 AND BCl3 IMPURITIES
JournalLe Journal de Physique IV
AuthorsOSADA, A.Author
DANZINGER, M.Author
HAUBNER, R.Author
LUX, B.Author
Year1991 (September)Volume2
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1991266Search in ResearchGate
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Mindat Ref. ID10295556Long-form Identifiermindat:1:5:10295556:1
GUID0
Full ReferenceOSADA, A., DANZINGER, M., HAUBNER, R., LUX, B. (1991) GRAIN REFINEMENT OF CVD TiC LAYERS BY AlCl3, ZrCl4 AND BCl3 IMPURITIES. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991266
Plain TextOSADA, A., DANZINGER, M., HAUBNER, R., LUX, B. (1991) GRAIN REFINEMENT OF CVD TiC LAYERS BY AlCl3, ZrCl4 AND BCl3 IMPURITIES. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991266
In(n.d.) Le Journal de Physique IV Vol. 2. EDP Sciences

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DANZINGER, M., PENG, J., HAUBNER, R., LUX, B. (1991) INFLUENCE OF CH4 AND Ar ON THE MORPHOLOGIES OF Al2O3 - CVD COATINGS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991268
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Tang, X., Haubner, R., Lux, B., Kieffer, B. (1995) Preparation of Ultrafine CVD WC Powders Deposited from WCl6 Gas Mixtures. Le Journal de Physique IV, 5. doi:10.1051/jphyscol:19955119
HAMMOND, M. L. (1991) CVD EXHAUST - SAFETY AND ENVIRONMENTAL SANITY. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991255
WALLING, R. H., MOSS, R. H. (1991) SAFETY AND ENVIRONMENTAL ASPECTS OF CVD. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991254
TISSIER, A., KHALLAAYOUNE, J., GERODOLLE, A., HUIZING, B. (1991) PLANARIZED INTERMETAL DIELECTRIC DEPOSITED BY DECR CVD. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991253
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SCHMADERER, F., HUBER, R., OETZMANN, H., WAHL, G. (1991) HIGH-TC-SUPERCONDUCTORS PREPARED BY CVD. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991264
 
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