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EMIG, G., SCHOCH, G., WORMER, O. (1993) Chemical vapor deposition of hafnium carbide and hafnium nitride. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993374

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Reference TypeJournal (article/letter/editorial)
TitleChemical vapor deposition of hafnium carbide and hafnium nitride
JournalLe Journal de Physique IV
AuthorsEMIG, G.Author
SCHOCH, G.Author
WORMER, O.Author
Year1993 (August)Volume3
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1993374Search in ResearchGate
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Mindat Ref. ID10296084Long-form Identifiermindat:1:5:10296084:8
GUID0
Full ReferenceEMIG, G., SCHOCH, G., WORMER, O. (1993) Chemical vapor deposition of hafnium carbide and hafnium nitride. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993374
Plain TextEMIG, G., SCHOCH, G., WORMER, O. (1993) Chemical vapor deposition of hafnium carbide and hafnium nitride. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993374
In(n.d.) Le Journal de Physique IV Vol. 3. EDP Sciences

See Also

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Wunder, V. K., Popovska, N., Emig, G. (1999) Hafnium carbide as a barrier in multilayer coatings by chemical vapor deposition (CVD). Le Journal de Physique IV, 9. doi:10.1051/jp4:1999864
Sourdiaucourt, P., Derré, A., Delhaès, P., David, P. (1999) Thermodynamical and experimental conditions of hafnium carbide chemical vapour deposition. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999846
ALEXANDROV, S. E. (1993) Chemical vapour deposition of nitride and oxynitride dielectric films. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993364
Popovska, N., Drothler, C., Wunder, V. K., Gerhard, H., Emig, G. (1999) Investigations on TiN, TiC and Ti(CN) obtained by chemical vapor deposition. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999855
Zhang, W. G., Hüttinger, K. J. (2001) Chemical vapor deposition of silicon carbide at various temperatures and surface area/volume ratios. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001307
Popovska, N., Schmidt, S., Edelmann, E., Wunder, V. K., Gerhard, H., Emig, G. (2001) Coating of continuous carbon fibers with double layers by chemical vapor deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013110
Sourdiaucourt, P., Derré, A., Delhaès, P., David, P. (1999) Mechanical reinforcement of carbon foam by hafnium carbide deposit. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998148
REAGAN, P. (1993) Chemical vapor composites (CVC). Le Journal de Physique IV, 3. doi:10.1051/jp4:1993375
SLIFIRSKI, J., TEYSSANDIER, F. (1993) Titanium carbide and titanium carbonitride obtained by chemical vapor deposition from orgranometallic precursor in the range 450-800°C. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993350
KANOH, H., SUGIURA, O., FUJIOKA, S., ARAMAKI, Y., HATTORI, T., MATSUMURA, M. (1991) LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION OF SILICON NITRIDE. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991298
FREDRIKSSON, E., CARLSSON, J.-O. (1993) Chemical vapour deposition of Al2O3 on titanium oxides. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993377
 
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