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Korevaar, G., Besling, W., Goossens, A., Schoonman, J. (1999) In situ mass spetrometry during laser-induced chemical vapor deposition of silicon carbonitride. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999896

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Reference TypeJournal (article/letter/editorial)
TitleIn situ mass spetrometry during laser-induced chemical vapor deposition of silicon carbonitride
JournalLe Journal de Physique IV
AuthorsKorevaar, G.Author
Besling, W.Author
Goossens, A.Author
Schoonman, J.Author
Year1999 (September)Volume9
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1999896Search in ResearchGate
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Mindat Ref. ID10301116Long-form Identifiermindat:1:5:10301116:7
GUID0
Full ReferenceKorevaar, G., Besling, W., Goossens, A., Schoonman, J. (1999) In situ mass spetrometry during laser-induced chemical vapor deposition of silicon carbonitride. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999896
Plain TextKorevaar, G., Besling, W., Goossens, A., Schoonman, J. (1999) In situ mass spetrometry during laser-induced chemical vapor deposition of silicon carbonitride. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999896
In(n.d.) Le Journal de Physique IV Vol. 9. EDP Sciences

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Besling, W. F.A., Goossens, A., Schoonman, J. (1999) In-situ Raman spectroscopy and laser-induced fluorescence during laser chemical vapor precipitation of silicon nanoparticles. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999868
Korevaar, G., Goossens, A., Schoonman, J. (1999) Synthesis of polycrystalline silicon films on metalized ceramic substrates with laser-assisted chemical vapor deposition. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999895
Goossens, A., Besling, W. F.A., Schoonman, J. (1999) Laser CVD of silicon nanoclusters and in-situ process chataracterization. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999865
Besling, W. F.A., van der Put, P. J.J.M., Schoonman, J. (1995) Laser-Induced Chemical Vapour Deposition of Silicon Carbonitride. Le Journal de Physique IV, 5. doi:10.1051/jphyscol:19955112
Meester, B., du Bois, R. A., Goossens, A., Schoonman, J. (1999) Phase controlled low-pressure chemical vapor deposition of iron(di)sulfide. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999853
Besling, W. F. A., Goossens, A., Meester, B., Schoonman, J. (1998) Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films. Journal of Applied Physics, 83 (1). 544-553 doi:10.1063/1.366669
Meester, B., Reijnen, L., Goossens, A., Schoonman, J. (1999) Synthesis of pyrite (FeS2) thin films by low pressure metal-organic chemical vapor deposition. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999877
Meester, B., Reijnen, L., de Lange, F., Goossens, A., Schoonman, J. (2001) Low pressure chemical vapor deposition of CuxS. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001330
Reijnen, L., Meester, B., Goossens, A., Schoonman, J. (1999) In-situ mass spectrometric study of the reaction mechanism in MOCVD of Pyrite (FeS2). Le Journal de Physique IV, 9. doi:10.1051/jp4:1999832
Reijnen, L., Meester, B., Goossens, A., Schoonman, J. (2001) Atomic layer deposition of CuxS. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013138
Kamlag, Y., Goossens, A., Colbeck, I., Schoonman, J. (2001) Formation of cubic SiC nanocrystals by laser-assisted CVD. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001358
 
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