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Liskovskaya, T. I., Bulusheva, L. G., Okotrub, A. V., Krupoder, S. A., Semyannikov, P. P., Asanov, I. P., Igumenov, I. K., Manaev, A. V., Traven, V. F., Cherkov, A. G. (2001) (HFA)Cu . 1,5-COD as the prospective precursor for CVD-technologies : The electronic structure, thermodynamical properties and process of formation of thin copper films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001309

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Reference TypeJournal (article/letter/editorial)
Title(HFA)Cu . 1,5-COD as the prospective precursor for CVD-technologies : The electronic structure, thermodynamical properties and process of formation of thin copper films
JournalLe Journal de Physique IV
AuthorsLiskovskaya, T. I.Author
Bulusheva, L. G.Author
Okotrub, A. V.Author
Krupoder, S. A.Author
Semyannikov, P. P.Author
Asanov, I. P.Author
Igumenov, I. K.Author
Manaev, A. V.Author
Traven, V. F.Author
Cherkov, A. G.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:2001309Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10302004Long-form Identifiermindat:1:5:10302004:6
GUID0
Full ReferenceLiskovskaya, T. I., Bulusheva, L. G., Okotrub, A. V., Krupoder, S. A., Semyannikov, P. P., Asanov, I. P., Igumenov, I. K., Manaev, A. V., Traven, V. F., Cherkov, A. G. (2001) (HFA)Cu . 1,5-COD as the prospective precursor for CVD-technologies : The electronic structure, thermodynamical properties and process of formation of thin copper films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001309
Plain TextLiskovskaya, T. I., Bulusheva, L. G., Okotrub, A. V., Krupoder, S. A., Semyannikov, P. P., Asanov, I. P., Igumenov, I. K., Manaev, A. V., Traven, V. F., Cherkov, A. G. (2001) (HFA)Cu . 1,5-COD as the prospective precursor for CVD-technologies : The electronic structure, thermodynamical properties and process of formation of thin copper films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001309
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences


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