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Maezono, Y., Yanagita, H., Nishi, K., Miyano, J.-I., Yokotani, A., Kurosawa, K., Hishinuma, N., Matsuno, H. (2001) Room temperature deposition of GeO2 thin film using dielectric barrier discharge driven excimer lamps. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013102

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Reference TypeJournal (article/letter/editorial)
TitleRoom temperature deposition of GeO2 thin film using dielectric barrier discharge driven excimer lamps
JournalLe Journal de Physique IV
AuthorsMaezono, Y.Author
Yanagita, H.Author
Nishi, K.Author
Miyano, J.-I.Author
Yokotani, A.Author
Kurosawa, K.Author
Hishinuma, N.Author
Matsuno, H.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013102Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10302008Long-form Identifiermindat:1:5:10302008:4
GUID0
Full ReferenceMaezono, Y., Yanagita, H., Nishi, K., Miyano, J.-I., Yokotani, A., Kurosawa, K., Hishinuma, N., Matsuno, H. (2001) Room temperature deposition of GeO2 thin film using dielectric barrier discharge driven excimer lamps. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013102
Plain TextMaezono, Y., Yanagita, H., Nishi, K., Miyano, J.-I., Yokotani, A., Kurosawa, K., Hishinuma, N., Matsuno, H. (2001) Room temperature deposition of GeO2 thin film using dielectric barrier discharge driven excimer lamps. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013102
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

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Kurosawa, K., Maezono, Y., Miyano, J.-I., Motoyama, T., Yokotani, A. (2001) GeO2 and SiO2 thin film preparation with CVD using ultraviolet excimer lamps. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001393
Motoyama, Y., Miyano, J.-I., Toshikawa, K., Yagi, Y., Yanagida, H., Kurosawa, K., Yokotani, A. (2001) Study of SiO2-films deposited by adding N2O or O2 to TEOS in photo-chemical vapor deposition at room temperature. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013142
Takezoe, Noritaka, Yokotani, Atsushi, Kurosawa, Kou, Sasaki, Wataru, Igarashi, Tatsushi, Matsuno, Hiromitsu (1999) SIO2 thin film preparation using dielectric barrier discharge-driven excimer lamps. Applied Surface Science, 138. 340-343 doi:10.1016/s0169-4332(98)00415-2
Kurosawa, K., Takezoe, N., Yanagida, H., Miyano, J., Motoyama, Y., Toshikawa, K., Kawasaki, Y., Yokotani, A. (2000) Silica film preparation by chemical vapor deposition using vacuum ultraviolet excimer lamps. Applied Surface Science, 168. 37-40 doi:10.1016/s0169-4332(00)00574-2
Miyano, K., Tonogai, T., Satoh, T., Oshima, H., Tokura, Y. (1999) Photoinduced and current-driven insulator/metal transition in manganites : A fluctuating route. Le Journal de Physique IV, 9. doi:10.1051/jp4:19991081
Nam, C. H., Shin, H. J., Lee, D. G., Cha, Y. H., Hong, K. H., Kim, J.-H. (2001) Tunable coherent femtosecond X-ray source driven by an intense femtosecond laser. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001267
Zhuang, W., Charneski, L. J., Evans, D. R., Hsu, S. T., Tang, Z., Guloy, A. M. (2001) CVD copper thin film deposition using (α-methylstyrene)Cu(I)(hfac). Le Journal de Physique IV, 11. doi:10.1051/jp4:2001370
Isai, G., Kovalgin, A., Holleman, J., Woerlee, P., Wallinga, H. (2001) Room temperature SiO2 films deposited by multipolar ECR PECVD. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001394
Yokotani, Atsushi, Takezoe, Noritaka, Kurosawa, Kou, Igarashi, Tatsushi, Matsuno, Hiromitu (1996) A single precursor photolitic chemical vapor deposition of silica film using a dielectric barier discharge xenon excimer lamp. Applied Physics Letters, 69 (10). 1399-1401 doi:10.1063/1.117594
BERGMANN, H. W., SCHUBERT, E., SCHUTTE, K. (1991) SURFACE MODIFICATIONS USING EXCIMER LASERS ; FUNDAMENTALS AND APPLICATIONS. Le Journal de Physique IV, 1. doi:10.1051/jp4:1991702
Pierson, J. F., Belmonte, T., Michel, H. (2001) Thermodynamic and experimental study of low temperature ZrB2 chemical vapor deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001311
 
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