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Halary-Wagner, E., Lambelet, P., Benvenuti, G., Hoffmann, P. (2001) Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013104

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Reference TypeJournal (article/letter/editorial)
TitleSelective area deposition of titanium dioxide thin films by light induced chemical vapour deposition
JournalLe Journal de Physique IV
AuthorsHalary-Wagner, E.Author
Lambelet, P.Author
Benvenuti, G.Author
Hoffmann, P.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013104Search in ResearchGate
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Mindat Ref. ID10302010Long-form Identifiermindat:1:5:10302010:7
GUID0
Full ReferenceHalary-Wagner, E., Lambelet, P., Benvenuti, G., Hoffmann, P. (2001) Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013104
Plain TextHalary-Wagner, E., Lambelet, P., Benvenuti, G., Hoffmann, P. (2001) Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013104
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

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Halary, E, Benvenuti, G, Wagner, F, Hoffmann, P (2000) Light induced chemical vapour deposition of titanium oxide thin films at room temperature. Applied Surface Science, 154. 146-151 doi:10.1016/s0169-4332(99)00425-0
Halary-Wagner, E., Wagner, F., Hoffmann, P. (2004) Titanium Dioxide Thin-Film Deposition on Polymer Substrate by Light Induced Chemical Vapor Deposition. Journal of the Electrochemical Society, 151. doi:10.1149/1.1775931
Halary-Wagner, E., Bret, T., Hoffmann, P. (2003) Light-induced chemical vapour deposition painting with titanium dioxide. Applied Surface Science, 208. 663-668 doi:10.1016/s0169-4332(02)01421-6
Halary, E., Haro-Poniatowski, E., Benvenuti, G., Hoffmann, P. (2000) Crystallinity of titania thin films deposited by light induced chemical vapor deposition. Applied Surface Science, 168. 61-65 doi:10.1016/s0169-4332(00)00849-7
Thévenin, P., Soltani, A., Bath, A. (2001) Synthesis of hexagonal boron nitride thin films by a plasma assisted chemical vapor deposition method. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013101
FREDRIKSSON, E., CARLSSON, J.-O. (1993) Chemical vapour deposition of Al2O3 on titanium oxides. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993377
ALEXANDROV, S. E. (1993) Chemical vapour deposition of nitride and oxynitride dielectric films. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993364
Parkin, I. P., Field, M. N. (1999) Atmospheric pressure chemical vapour deposition of chromium oxide films. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999848
Hoffmann, S., Waser, R. (1998) Curie-Weiss law of (Ba1-xSrx)TiO3 thin films prepared by chemical solution deposition. Le Journal de Physique IV, 8. doi:10.1051/jp4:1998942
Nieto, J.-P., Caussat, B., Couderc, J.-P., Orain, I., Jeannerot, L. (2001) Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, O3, TMB, TMPi : Determination of a chemical mechanism. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001318
Dabou, X., Samaras, P., Sakellaropoulos, G. P. (2001) Modification of activated carbon fiber pore structure by coke deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001335
 
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