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Zemskova, S. M., Haynes, J. A., Cooley, K. M. (2001) CVD mullite and mullite-alumina corrosion protection coatings for silicon based ceramics. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013107

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Reference TypeJournal (article/letter/editorial)
TitleCVD mullite and mullite-alumina corrosion protection coatings for silicon based ceramics
JournalLe Journal de Physique IV
AuthorsZemskova, S. M.Author
Haynes, J. A.Author
Cooley, K. M.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013107Search in ResearchGate
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Mindat Ref. ID10302013Long-form Identifiermindat:1:5:10302013:8
GUID0
Full ReferenceZemskova, S. M., Haynes, J. A., Cooley, K. M. (2001) CVD mullite and mullite-alumina corrosion protection coatings for silicon based ceramics. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013107
Plain TextZemskova, S. M., Haynes, J. A., Cooley, K. M. (2001) CVD mullite and mullite-alumina corrosion protection coatings for silicon based ceramics. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013107
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

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Nubian, K., Wahl, G., Saruhan, B., Schneider, H. (2001) Fiber-coatings for fiber-reinforced mullite/mullite composites. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013109
Nubian, K., Saruhan, B., Schneider, H., Wahl, G. (1999) CVD-produced ZrO2- and C/ZrO2-fiber coatings for mullite/mullite composites. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998131
PENA, P., BARTOLOMÉ, J., REQUENA, J., MOYA, J. S. (1993) Mullite-alumina functionally gradient ceramics. Le Journal de Physique IV, 3. doi:10.1051/jp4:19937194
Haynes, J. A., Zemskova, S. M., Lin, H. T., Ferber, M. K., Westphal, W. (2006) Characterization of Chemical Vapor-Deposited (CVD) Mullite+CVD Alumina+Plasma-Sprayed Tantalum Oxide Coatings on Silicon Nitride Vanes After an Industrial Gas Turbine Engine Field Test. Journal of the American Ceramic Society, 89 (11). 3560-3563 doi:10.1111/j.1551-2916.2006.01256.x
Hofstätter, M., Atakan, B., Kohse-Höinghaus, K. (2001) CVD growth of silicon films at high rates. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001337
Zemskova, S. M., Haynes, J. A., Besmann, T. M., Hunt, R. D., Beach, D. B., Golovlev, V. N. (2000) Preparation and characterization of some alumosiloxanes as single-source MOCVD precursors for aluminosilicate coatings. Le Journal de Physique IV, 10. doi:10.1051/jp4:2000205
Piglmayer, K., Boman, M., Lindstam, M., Chabicovsky, R. (2001) Photon assisted CVD. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001389
He, L., Hitchman, M. L., Shamlian, S. H., Alexandrov, S. E. (2001) Organic chemistry by CVD. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001333
Norman, J. A.T. (2001) Advances in copper CVD for the semiconductor industry. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001363
Armas, B., de Icaza Herrera, M., Combescure, C., Sibieude, F., Thenegal, D. (1999) Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999849
Harsta, A. (2001) Halide CVD of dielectric and ferroelectric oxides. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001328
 
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