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Meester, B., Reijnen, L., Goossens, A., Schoonman, J. (2001) Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013144

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Reference TypeJournal (article/letter/editorial)
TitleComparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films
JournalLe Journal de Physique IV
AuthorsMeester, B.Author
Reijnen, L.Author
Goossens, A.Author
Schoonman, J.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013144Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10302054Long-form Identifiermindat:1:5:10302054:1
GUID0
Full ReferenceMeester, B., Reijnen, L., Goossens, A., Schoonman, J. (2001) Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013144
Plain TextMeester, B., Reijnen, L., Goossens, A., Schoonman, J. (2001) Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013144
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

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Reijnen, L., Meester, B., Goossens, A., Schoonman, J. (2001) Atomic layer deposition of CuxS. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013138
Meester, B., Reijnen, L., de Lange, F., Goossens, A., Schoonman, J. (2001) Low pressure chemical vapor deposition of CuxS. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001330
Meester, B., Reijnen, L., Goossens, A., Schoonman, J. (1999) Synthesis of pyrite (FeS2) thin films by low pressure metal-organic chemical vapor deposition. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999877
Reijnen, L., Meester, B., Goossens, A., Schoonman, J. (1999) In-situ mass spectrometric study of the reaction mechanism in MOCVD of Pyrite (FeS2). Le Journal de Physique IV, 9. doi:10.1051/jp4:1999832
Meester, B., du Bois, R. A., Goossens, A., Schoonman, J. (1999) Phase controlled low-pressure chemical vapor deposition of iron(di)sulfide. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999853
Deschanvres, J. L., Meffre, W. (2001) Deposition by an aerosol assisted MOCVD process of Eu or Er doped Y2O3-P2O5 thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001383
Kamlag, Y., Goossens, A., Colbeck, I., Schoonman, J. (2001) Formation of cubic SiC nanocrystals by laser-assisted CVD. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001358
Reijnen, Liesbeth, Meester, Ben, de Lange, Frits, Schoonman, Joop, Goossens, Albert (2005) Comparison of CuxS Films Grown by Atomic Layer Deposition and Chemical Vapor Deposition. Chemistry of Materials, 17. 2724-2728 doi:10.1021/cm035238b
Korevaar, G., Goossens, A., Schoonman, J. (1999) Synthesis of polycrystalline silicon films on metalized ceramic substrates with laser-assisted chemical vapor deposition. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999895
SANTISO, J., FIGUERAS, A. (1993) YBa2Cu3O7-x thin films deposition on YSZ substrates by MOCVD. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993348
Chen, G. C., Kim, M. C., Kim, T. H., Lee, S.-B., Boo, J.-H. (2001) Growth of BON thin films by plasma assisted MOCVD and study of deposition parameter effects on the film structure. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001396
 
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