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Landreau, X., Lanfant, B., Merle, T., Dublanche-Tixier, C., Tristant, P. (2012) A thorough FT-IR spectroscopy study on micrometric silicon oxide films deposited by atmospheric pressure microwave plasma torch. The European Physical Journal D, 66. doi:10.1140/epjd/e2012-20647-x

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Reference TypeJournal (article/letter/editorial)
TitleA thorough FT-IR spectroscopy study on micrometric silicon oxide films deposited by atmospheric pressure microwave plasma torch
JournalThe European Physical Journal D
AuthorsLandreau, X.Author
Lanfant, B.Author
Merle, T.Author
Dublanche-Tixier, C.Author
Tristant, P.Author
Year2012 (June)Volume66
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1140/epjd/e2012-20647-xSearch in ResearchGate
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Mindat Ref. ID10360418Long-form Identifiermindat:1:5:10360418:5
GUID0
Full ReferenceLandreau, X., Lanfant, B., Merle, T., Dublanche-Tixier, C., Tristant, P. (2012) A thorough FT-IR spectroscopy study on micrometric silicon oxide films deposited by atmospheric pressure microwave plasma torch. The European Physical Journal D, 66. doi:10.1140/epjd/e2012-20647-x
Plain TextLandreau, X., Lanfant, B., Merle, T., Dublanche-Tixier, C., Tristant, P. (2012) A thorough FT-IR spectroscopy study on micrometric silicon oxide films deposited by atmospheric pressure microwave plasma torch. The European Physical Journal D, 66. doi:10.1140/epjd/e2012-20647-x
In(n.d.) The European Physical Journal D Vol. 66. Springer Science and Business Media LLC

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Landreau, Xavier, Chagnon, Pierre, Dublanche-Tixier, Christelle, Jaoul, Cédric, Tristant, Pascal (2012) Tailoring the mechanical properties of SiOxHyCz films deposited by atmospheric pressure microwave plasma torch with a Rechtschaffner design of experiments: A pragmatic statistical approach. Computational Materials Science, 60. 32-43 doi:10.1016/j.commatsci.2012.03.004
Gazal, Y., Chazelas, C., Dublanche-Tixier, C., Tristant, P. (2017) Contribution of optical emission spectroscopy measurements to the understanding of TiO2 growth by chemical vapor deposition using an atmospheric-pressure plasma torch. Journal of Applied Physics, 121 (12). 123301pp. doi:10.1063/1.4979024
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