Schäfer, Jan, Sigeneger, Florian, Foest, Rüdiger, Loffhagen, Detlef, Weltmann, Klaus-Dieter (2018) On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films. The European Physical Journal D, 72. doi:10.1140/epjd/e2017-80364-6
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films | ||
| Journal | The European Physical Journal D | ||
| Authors | Schäfer, Jan | Author | |
| Sigeneger, Florian | Author | ||
| Foest, Rüdiger | Author | ||
| Loffhagen, Detlef | Author | ||
| Weltmann, Klaus-Dieter | Author | ||
| Year | 2018 (May) | Volume | 72 |
| Publisher | Springer Science and Business Media LLC | ||
| DOI | doi:10.1140/epjd/e2017-80364-6Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 10362208 | Long-form Identifier | mindat:1:5:10362208:0 |
| GUID | 0 | ||
| Full Reference | Schäfer, Jan, Sigeneger, Florian, Foest, Rüdiger, Loffhagen, Detlef, Weltmann, Klaus-Dieter (2018) On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films. The European Physical Journal D, 72. doi:10.1140/epjd/e2017-80364-6 | ||
| Plain Text | Schäfer, Jan, Sigeneger, Florian, Foest, Rüdiger, Loffhagen, Detlef, Weltmann, Klaus-Dieter (2018) On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films. The European Physical Journal D, 72. doi:10.1140/epjd/e2017-80364-6 | ||
| In | (n.d.) The European Physical Journal D Vol. 72. Springer Science and Business Media LLC | ||
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