Reference Type | Journal (article/letter/editorial) |
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Title | Oxidation at theSi/SiO2Interface: Influence of the Spin Degree of Freedom |
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Journal | Physical Review Letters |
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Authors | Orellana, W. | Author |
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da Silva, Antônio J. R. | Author |
Fazzio, A. | Author |
Year | 2003 (January 8) | Volume | 90 |
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Issue | 1 |
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Publisher | American Physical Society (APS) |
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DOI | doi:10.1103/physrevlett.90.016103Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 10588276 | Long-form Identifier | mindat:1:5:10588276:5 |
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GUID | 0 |
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Full Reference | Orellana, W., da Silva, Antônio J. R., Fazzio, A. (2003) Oxidation at theSi/SiO2Interface: Influence of the Spin Degree of Freedom. Physical Review Letters, 90 (1). doi:10.1103/physrevlett.90.016103 |
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Plain Text | Orellana, W., da Silva, Antônio J. R., Fazzio, A. (2003) Oxidation at theSi/SiO2Interface: Influence of the Spin Degree of Freedom. Physical Review Letters, 90 (1). doi:10.1103/physrevlett.90.016103 |
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In | (2003, January) Physical Review Letters Vol. 90 (1) American Physical Society (APS) |
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