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Li, Hui, Zhang, Yongzhe, Pan, Xiaojun, Wang, Tao, Xie, Erqing (2009) The effects of thermal annealing on properties of MgxZn1−xO films by sputtering. Journal of Alloys and Compounds, 472. 208-210 doi:10.1016/j.jallcom.2008.04.018

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Reference TypeJournal (article/letter/editorial)
TitleThe effects of thermal annealing on properties of MgxZn1−xO films by sputtering
JournalJournal of Alloys and Compounds
AuthorsLi, HuiAuthor
Zhang, YongzheAuthor
Pan, XiaojunAuthor
Wang, TaoAuthor
Xie, ErqingAuthor
Year2009 (March)Volume472
PublisherElsevier BV
DOIdoi:10.1016/j.jallcom.2008.04.018Search in ResearchGate
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Mindat Ref. ID11891966Long-form Identifiermindat:1:5:11891966:3
GUID0
Full ReferenceLi, Hui, Zhang, Yongzhe, Pan, Xiaojun, Wang, Tao, Xie, Erqing (2009) The effects of thermal annealing on properties of MgxZn1−xO films by sputtering. Journal of Alloys and Compounds, 472. 208-210 doi:10.1016/j.jallcom.2008.04.018
Plain TextLi, Hui, Zhang, Yongzhe, Pan, Xiaojun, Wang, Tao, Xie, Erqing (2009) The effects of thermal annealing on properties of MgxZn1−xO films by sputtering. Journal of Alloys and Compounds, 472. 208-210 doi:10.1016/j.jallcom.2008.04.018
In(n.d.) Journal of Alloys and Compounds Vol. 472. Elsevier BV

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