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Silva-Quinones, Dhamelyz, He, Chuan, Dwyer, Kevin J., Butera, Robert E., Wang, George T., Teplyakov, Andrew V. (2020) Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds. Langmuir, 36 (43) 12866-12876 doi:10.1021/acs.langmuir.0c02088

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Reference TypeJournal (article/letter/editorial)
TitleReaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds
JournalLangmuir
AuthorsSilva-Quinones, DhamelyzAuthor
He, ChuanAuthor
Dwyer, Kevin J.Author
Butera, Robert E.Author
Wang, George T.Author
Teplyakov, Andrew V.Author
Year2020 (November 3)Volume36
Issue43
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/acs.langmuir.0c02088Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID13222759Long-form Identifiermindat:1:5:13222759:1
GUID0
Full ReferenceSilva-Quinones, Dhamelyz, He, Chuan, Dwyer, Kevin J., Butera, Robert E., Wang, George T., Teplyakov, Andrew V. (2020) Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds. Langmuir, 36 (43) 12866-12876 doi:10.1021/acs.langmuir.0c02088
Plain TextSilva-Quinones, Dhamelyz, He, Chuan, Dwyer, Kevin J., Butera, Robert E., Wang, George T., Teplyakov, Andrew V. (2020) Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds. Langmuir, 36 (43) 12866-12876 doi:10.1021/acs.langmuir.0c02088
In(2020, November) Langmuir Vol. 36 (43) American Chemical Society (ACS)

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Silva-Quinones, Dhamelyz, Butera, Robert E., Wang, George T., Teplyakov, Andrew V. (2021) Solution Chemistry to Control Boron-Containing Monolayers on Silicon: Reactions of Boric Acid and 4-Fluorophenylboronic Acid with H- and Cl-terminated Si(100) Langmuir, 37 (23) 7194-7202 doi:10.1021/acs.langmuir.1c00763
Silva-Quinones, Dhamelyz, He, Chuan, Butera, Robert E., Wang, George T., Teplyakov, Andrew V. (2020) Reaction of BCl3 with H- and Cl-terminated Si(1 0 0) as a pathway for selective, monolayer doping through wet chemistry. Applied Surface Science, 533. 146907pp. doi:10.1016/j.apsusc.2020.146907
He, Chuan, Teplyakov, Andrew V. (2018) 29,31-H Phthalocyanine Covalently Bonded Directly to a Si(111) Surface Retains Its Metalation Ability. Langmuir, 34. 10880-10888 doi:10.1021/acs.langmuir.8b02259
Gao, Fei, Teplyakov, Andrew V. (2014) Reaction of Hydrazine with a Chlorine-Terminated Si(111) Surface. The Journal of Physical Chemistry C, 118 (48). 27998-28006 doi:10.1021/jp5095307
Rodríguez-Reyes, Juan Carlos F., Teplyakov, Andrew V. (2007) Surface Transamination Reaction for Tetrakis(dimethylamido)titanium with NHX-Terminated Si(100) Surfaces. The Journal of Physical Chemistry C, 111 (44). 16498-16505 doi:10.1021/jp074656r
He, Chuan, Cai, Xuefen, Wei, Su-Huai, Janotti, Anderson, Teplyakov, Andrew V. (2020) Self-Catalyzed Sensitization of CuO Nanowires via a Solvent-free Click Reaction. Langmuir, 36 (48) 14539-14545 doi:10.1021/acs.langmuir.0c02262
Gao, Fei, Teplyakov, Andrew V. (2016) Dehydrohalogenation Condensation Reaction of Phenylhydrazine with Cl-Terminated Si(111) Surfaces. The Journal of Physical Chemistry C, 120 (10). 5539-5548 doi:10.1021/acs.jpcc.5b12424
Gao, Fei, Teplyakov, Andrew V. (2017) Monolayer of Hydrazine Facilitates the Direct Covalent Attachment of C60 Fullerene to a Silicon Surface. Langmuir, 33. 8632-8639 doi:10.1021/acs.langmuir.6b03975
Miller, Timothy, Teplyakov, Andrew V. (2014) Attachment Chemistry of PCBM to a Primary-Amine-Terminated Organic Monolayer on a Si(111) Surface. Langmuir, 30. 5105-5114 doi:10.1021/la404798k
Tian, Fangyuan, Cui, Yuexing, Teplyakov, Andrew V. (2014) Nitroxidation of H-Terminated Si(111) Surfaces with Nitrobenzene and Nitrosobenzene. The Journal of Physical Chemistry C, 118 (1). 502-512 doi:10.1021/jp4102702
Leftwich, Timothy R., Madachik, Mark R., Teplyakov, Andrew V. (2008) Dehydrative Cyclocondensation Reactions on Hydrogen-Terminated Si(100) and Si(111): An ex Situ Tool for the Modification of Semiconductor Surfaces. Journal Of The American Chemical Society, 130 (48) 16216-16223 doi:10.1021/ja802645t
 
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