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Tanaka, Kuniaki (1970) Photoconductivity of CdSe Films Prepared by a Vapor Evaporating-Reactive Sputtering Method. Japanese Journal of Applied Physics, 9 (9) 1070-1077 doi:10.1143/jjap.9.1070

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Reference TypeJournal (article/letter/editorial)
TitlePhotoconductivity of CdSe Films Prepared by a Vapor Evaporating-Reactive Sputtering Method
JournalJapanese Journal of Applied Physics
AuthorsTanaka, KuniakiAuthor
Year1970 (September)Volume9
Issue9
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.9.1070Search in ResearchGate
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Mindat Ref. ID14978097Long-form Identifiermindat:1:5:14978097:3
GUID0
Full ReferenceTanaka, Kuniaki (1970) Photoconductivity of CdSe Films Prepared by a Vapor Evaporating-Reactive Sputtering Method. Japanese Journal of Applied Physics, 9 (9) 1070-1077 doi:10.1143/jjap.9.1070
Plain TextTanaka, Kuniaki (1970) Photoconductivity of CdSe Films Prepared by a Vapor Evaporating-Reactive Sputtering Method. Japanese Journal of Applied Physics, 9 (9) 1070-1077 doi:10.1143/jjap.9.1070
In(1970, September) Japanese Journal of Applied Physics Vol. 9 (9) Japan Society of Applied Physics

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Yasuoka, Yoshizumi, Wada, Masanobu (1970) Photoconductivity of PbSe Films. Japanese Journal of Applied Physics, 9 (5) 452-457 doi:10.1143/jjap.9.452
Takemoto, Toyoki, Ishihara, Takashi, Akiyama, Kenji (1966) Investigation of Si-Ta2O5System Prepared by Reactive Sputtering. Japanese Journal of Applied Physics, 5 (9) 844-845 doi:10.1143/jjap.5.844
Tanaka, Saburo, Itozaki, Hideo (1989) Crystallinity and Morphology of Superconducting Thin Films Prepared by Sputtering. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l441
Suzuoki, Yasuo, Matsuno, Noriaki, Tabata, Akimori, Takeda, Masashi, Mizutani, Teruyosi (1995) Properties of the CdSe-Doped Glass Thin Films Prepared by Ion-Beam Sputtering Method. Japanese Journal of Applied Physics, 34. 1631-1637 doi:10.1143/jjap.34.1631
Tsutsumi, Tadashi (1970) Dielectric Properties of Y2O3Thin Films Prepared by Vacuum Evaporation. Japanese Journal of Applied Physics, 9 (7) 735-739 doi:10.1143/jjap.9.735
Ohyama, Masanori, Ito, Hiroshi, Takeuchi, Manabu (2005) Growth, Optical and Structural Characterization of Layered GaS Films Prepared by Reactive RF Sputtering Method. Japanese Journal of Applied Physics, 44 (7) 4780-4783 doi:10.1143/jjap.44.4780
Miyata, Naoyuki, Miyake, Kiyoshi (1978) Cd–Sn Oxide Films by DC Reactive Sputtering as Transparent Electrodes. Japanese Journal of Applied Physics, 17 (9) 1673-1674 doi:10.1143/jjap.17.1673
Miyazaki, Hidetoshi (2008) Electrical and Optical Properties of Amorphous and Crystalline Nondoped WO3-xFilms Prepared by Reactive RF Sputtering. Japanese Journal of Applied Physics, 47 (9) 7295-7297 doi:10.1143/jjap.47.7295
Shoji, Fumiya, Nagata, Saburo (1974) Structure and Deposition Mechanism of Molybdenum Nitride Films Prepared by Reactive Sputtering. Japanese Journal of Applied Physics, 13 (7) 1072-1078 doi:10.1143/jjap.13.1072
Sun, Yong, Miyasato, Tatsuro (1995) Characterization of Stress in Porous Silicon Films Prepared by Reactive Hydrogen Plasma Sputtering Technique. Japanese Journal of Applied Physics, 34. doi:10.1143/jjap.34.l1248
Kaneda, Kazuhiro, Suzuki, Shigeo (1991) Physical Properties of Tungsten Oxide Films Deposited by a Reactive Sputtering Method. Japanese Journal of Applied Physics, 30. 1841-1846 doi:10.1143/jjap.30.1841
 
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