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Ikezawa, Shunjiro, Tsuzuki, Masataka, Aoki, Takashi, Mikami, Osamu (1981) Wireless Excitation of Ion Acoustic Wave in a Plasma. Japanese Journal of Applied Physics, 20 (1) 297-298 doi:10.1143/jjap.20.297

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Reference TypeJournal (article/letter/editorial)
TitleWireless Excitation of Ion Acoustic Wave in a Plasma
JournalJapanese Journal of Applied Physics
AuthorsIkezawa, ShunjiroAuthor
Tsuzuki, MasatakaAuthor
Aoki, TakashiAuthor
Mikami, OsamuAuthor
Year1981 (January)Volume20
Issue1
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.20.297Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14984573Long-form Identifiermindat:1:5:14984573:3
GUID0
Full ReferenceIkezawa, Shunjiro, Tsuzuki, Masataka, Aoki, Takashi, Mikami, Osamu (1981) Wireless Excitation of Ion Acoustic Wave in a Plasma. Japanese Journal of Applied Physics, 20 (1) 297-298 doi:10.1143/jjap.20.297
Plain TextIkezawa, Shunjiro, Tsuzuki, Masataka, Aoki, Takashi, Mikami, Osamu (1981) Wireless Excitation of Ion Acoustic Wave in a Plasma. Japanese Journal of Applied Physics, 20 (1) 297-298 doi:10.1143/jjap.20.297
In(1981, January) Japanese Journal of Applied Physics Vol. 20 (1) Japan Society of Applied Physics

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Ikezawa, Shunjiro, Tsuzuki, Masataka, Aoki, Takashi, Nonaka, Shigehiko, Nakamura, Yoshiharu (1982) Remote Excitation of Electron Plasma Waves by a Modulated Laser Beam. Japanese Journal of Applied Physics, 21. 410-411 doi:10.1143/jjap.21.410
Ikezawa, Shunjiro, Nakamura, Yoshiharu (1979) Wave Pattern of Non-Dispersive Electron Wave in a Maxwellian Plasma. Japanese Journal of Applied Physics, 18 (6) 1201-1202 doi:10.1143/jjap.18.1201
Kando, Masashi, Kishimoto, Shigeru, Sugai, Hideo, Ikezawa, Shunjiro (1988) Excitation of Azimuthally Propagating Ion-Cyclotron Drift Waves in Large Magnetized Plasma. Japanese Journal of Applied Physics, 27. 2128-2133 doi:10.1143/jjap.27.2128
Aoki, Takashi, Ikezawa, Shunjiro (1982) Germination and Growth of a Vegetable Exposed to Very Severe Environmental Conditions Experimentally Induced by High Voltage. Japanese Journal of Applied Physics, 21. 1373-1378 doi:10.1143/jjap.21.1373
Ikezawa, Shunjiro, Okuda, Takayoshi (1976) Observation ofQFactor of Axially Symmetric Surface Wave Excited in a Cylindrical Cavity with a Magnetized Plasma. Japanese Journal of Applied Physics, 15 (2) 339-348 doi:10.1143/jjap.15.339
Mikami, Osamu (1981) 1.55 µm GaInAsP/InP Distributed Feedback Lasers. Japanese Journal of Applied Physics, 20 (7) doi:10.1143/jjap.20.l488
Ikezawa, Shunjiro, Tsuzuki, Masataka, Takeda, Susumu (1982) Frequency Dependence of H.F. Plugging of a Plasma. Journal of the Physical Society of Japan, 51 (5). 1353-1354 doi:10.1143/jpsj.51.1353
Ikezawa, Shunjiro, Tsuzuki, Masataka, Takeda, Susumu (1982) Erratum: “Frequency Dependence of H.F. Plugging of a Plasma”. Journal of the Physical Society of Japan, 51 (7). 2369 doi:10.1143/jpsj.51.2369
Yamazumi, Tomiya, Ikezawa, Shunjiro (1990) Control of the Two-Electron-Temperature Plasma Parameter in a DP Device. Japanese Journal of Applied Physics, 29. 1807-1813 doi:10.1143/jjap.29.1807
Kuboi, Osamu (1981) Degradation of ITO Film in Glow-Discharge Plasma. Japanese Journal of Applied Physics, 20 (11) doi:10.1143/jjap.20.l783
Shinohara, Shunjiro (1997) Propagating Wave Characteristics for Plasma Production in Plasma Processing Field. Japanese Journal of Applied Physics, 36. 4695-4703 doi:10.1143/jjap.36.4695
 
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