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Takeda, Fumio, Mori, Teruki, Takahashi, Takakazu (1981) Effect of Hydrogen Gas onc-Axis Oriented AlN Films Prepared by Reactive Magnetron Sputtering. Japanese Journal of Applied Physics, 20 (3) doi:10.1143/jjap.20.l169

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Reference TypeJournal (article/letter/editorial)
TitleEffect of Hydrogen Gas onc-Axis Oriented AlN Films Prepared by Reactive Magnetron Sputtering
JournalJapanese Journal of Applied Physics
AuthorsTakeda, FumioAuthor
Mori, TerukiAuthor
Takahashi, TakakazuAuthor
Year1981 (March)Volume20
Issue3
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.20.l169Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14984893Long-form Identifiermindat:1:5:14984893:2
GUID0
Full ReferenceTakeda, Fumio, Mori, Teruki, Takahashi, Takakazu (1981) Effect of Hydrogen Gas onc-Axis Oriented AlN Films Prepared by Reactive Magnetron Sputtering. Japanese Journal of Applied Physics, 20 (3) doi:10.1143/jjap.20.l169
Plain TextTakeda, Fumio, Mori, Teruki, Takahashi, Takakazu (1981) Effect of Hydrogen Gas onc-Axis Oriented AlN Films Prepared by Reactive Magnetron Sputtering. Japanese Journal of Applied Physics, 20 (3) doi:10.1143/jjap.20.l169
In(1981, March) Japanese Journal of Applied Physics Vol. 20 (3) Japan Society of Applied Physics

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Takeda, Fumio, Hata, Tomonobu (1980) Low Temperature Deposition of OrientedC-Axis AlN Films on Glass Substrates by Reactive Magnetron Sputtering. Japanese Journal of Applied Physics, 19 (5) 1001-1002 doi:10.1143/jjap.19.1001
Okano, Hiroshi, Takahashi, Yusuke, Tanaka, Toshiharu, Shibata, Kenichi, Nakano, Shoichi (1992) Preparation ofc-Axis Oriented AlN Thin Films by Low-Temperature Reactive Sputtering. Japanese Journal of Applied Physics, 31. 3446-3451 doi:10.1143/jjap.31.3446
Tanabe, Keiichi, Michikami, Osamu (1981) Synthesis of Nb3Al Thin Films by Magnetron Sputtering. Japanese Journal of Applied Physics, 20 (5) doi:10.1143/jjap.20.l359
Hata, Tomonobu, Takeda, Fumio, Morimoto, Osamu, Noda, Etsuji, Hada, Toshio (1981) High Rate Deposition of Thick Piezoelectric ZnO and AlN Films Using a New Magnetron Sputtering Technique. Japanese Journal of Applied Physics, 20. 145 doi:10.7567/jjaps.20s3.145
Takahashi, Takakazu, Yoneda, Masaaki, Naoe, Masahiko (1989) Deposition of Amorphous CoZrNb Films Using CMF Magnetron Sputtering Technique. Japanese Journal of Applied Physics, 28. 379-383 doi:10.1143/jjap.28.379
Kao, Kuo-Sheng, Cheng, Chien-Chuan, Chen, Ying-Chung (2001) Synthesis ofC-Axis-Oriented Aluminum Nitride Films by Reactive RF Magnetron Sputtering for Surface Acoustic Wave. Japanese Journal of Applied Physics, 40. 4969-4973 doi:10.1143/jjap.40.4969
Fujimori, Susumu, Nagai, Kazutoshi (1981) The Effect of Ion Bombardment on Carbon Films Prepared by Laser Evaporation. Japanese Journal of Applied Physics, 20 (3) doi:10.1143/jjap.20.l194
Serikawa, Tadashi, Yachi, Toshiaki (1981) Effect of Mixing Hydrogen-Argon on Magnetron Sputtered SiO2Films. Japanese Journal of Applied Physics, 20 (2) doi:10.1143/jjap.20.l111
Ito, Sinichi, Takahashi, Kenji, Okamoto, Shoji, Koutsaroff, Ivoyl P., Cervin-Lawry, Andrew, Funakubo, Hiroshi (2005) Orientation Dependence of Epitaxial and One-Axis-Oriented (Ba0.5Sr0.5)TiO3Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 44 (9) 6881-6884 doi:10.1143/jjap.44.6881
Yoshimura, Kazuki, Miki, Takeshi, Tanemura, Sakae (1995) Nickel Oxide Electrochromic Thin Films Prepared by Reactive DC Magnetron Sputtering. Japanese Journal of Applied Physics, 34. 2440-2446 doi:10.1143/jjap.34.2440
Yoshimura, Kazuki, Miki, Takeshi, Iwama, Saburo, SakaeTanemura, (1995) Niobium Oxide Electrochromic Thin Films Prepared by Reactive DC Magnetron Sputtering. Japanese Journal of Applied Physics, 34. doi:10.1143/jjap.34.l1293
 
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