Okuyama, Masanori, Toyoda, Yoshihiko, Hamakawa, Yoshihiro (1984) Photo-Induced Chemical Vapor Deposition of SiO2Film Using Direct Excitation Process by Deuterium Lamp. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l97
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Photo-Induced Chemical Vapor Deposition of SiO2Film Using Direct Excitation Process by Deuterium Lamp | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Okuyama, Masanori | Author | |
Toyoda, Yoshihiko | Author | ||
Hamakawa, Yoshihiro | Author | ||
Year | 1984 (February 20) | Volume | 23 |
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.23.l97Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 14987757 | Long-form Identifier | mindat:1:5:14987757:4 |
GUID | 0 | ||
Full Reference | Okuyama, Masanori, Toyoda, Yoshihiko, Hamakawa, Yoshihiro (1984) Photo-Induced Chemical Vapor Deposition of SiO2Film Using Direct Excitation Process by Deuterium Lamp. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l97 | ||
Plain Text | Okuyama, Masanori, Toyoda, Yoshihiko, Hamakawa, Yoshihiro (1984) Photo-Induced Chemical Vapor Deposition of SiO2Film Using Direct Excitation Process by Deuterium Lamp. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l97 | ||
In | (1984) Japanese Journal of Applied Physics Vol. 23. Japan Society of Applied Physics |
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