Reference Type | Journal (article/letter/editorial) |
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Title | Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering |
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Journal | Japanese Journal of Applied Physics |
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Authors | Minami, Tadatsugu | Author |
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Sato, Hirotoshi | Author |
Nanto, Hidehito | Author |
Takata, Shinzo | Author |
Year | 1986 (September 20) | Volume | 25 |
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Publisher | Japan Society of Applied Physics |
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DOI | doi:10.1143/jjap.25.l776Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 14989191 | Long-form Identifier | mindat:1:5:14989191:4 |
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GUID | 0 |
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Full Reference | Minami, Tadatsugu, Sato, Hirotoshi, Nanto, Hidehito, Takata, Shinzo (1986) Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 25. doi:10.1143/jjap.25.l776 |
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Plain Text | Minami, Tadatsugu, Sato, Hirotoshi, Nanto, Hidehito, Takata, Shinzo (1986) Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 25. doi:10.1143/jjap.25.l776 |
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In | (1986) Japanese Journal of Applied Physics Vol. 25. Japan Society of Applied Physics |
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