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Tomimasu, Takio (1987) An Electron Undulating Ring Dedicated to VLSI Lithography. Japanese Journal of Applied Physics, 26. 741-746 doi:10.1143/jjap.26.741

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Reference TypeJournal (article/letter/editorial)
TitleAn Electron Undulating Ring Dedicated to VLSI Lithography
JournalJapanese Journal of Applied Physics
AuthorsTomimasu, TakioAuthor
Year1987 (May 20)Volume26
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.26.741Search in ResearchGate
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Mindat Ref. ID14989712Long-form Identifiermindat:1:5:14989712:1
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Full ReferenceTomimasu, Takio (1987) An Electron Undulating Ring Dedicated to VLSI Lithography. Japanese Journal of Applied Physics, 26. 741-746 doi:10.1143/jjap.26.741
Plain TextTomimasu, Takio (1987) An Electron Undulating Ring Dedicated to VLSI Lithography. Japanese Journal of Applied Physics, 26. 741-746 doi:10.1143/jjap.26.741
In(1987) Japanese Journal of Applied Physics Vol. 26. Japan Society of Applied Physics

See Also

These are possibly similar items as determined by title/reference text matching only.

Tomimasu, T., Noguchi, T., Sugiyama, S., Yamazaki, T., Mikado, T. (1985) An Electron Undulating Ring for VLSI Lithography. IEEE Transactions on Nuclear Science, 32 (5) 3403-3405 doi:10.1109/tns.1985.4334382
Takada, Hiroshi, Hirata, Yoshihiro, Tomimasu, Takio (1992) A New Method for Measuring the Neutralization Factor in a Compact Electron Storage Ring. Japanese Journal of Applied Physics, 31. 2565-2569 doi:10.1143/jjap.31.2565
Takada, Hiroshi, Tsutsui, Yasumitsu, Hirata, Yoshihiro, Tomimasu, Takio (1991) An Energy Compression System for High-Efficiency Injection in a Compact Storage Ring. Japanese Journal of Applied Physics, 30. 2613-2614 doi:10.1143/jjap.30.2613
Tanino, Hiroshi, Hoh, Koichiro, Hirata, Masahiro, Ichimura, Shingo, Atoda, Nobufumi, Tomimasu, Takio, Noguchi, Tsutomu, Sugiyama, Suguru, Yamazaki, Tetsuo (1983) Large Area Exposure in Synchrotron Radiation Lithography Utilizing the Steering of the Electron Beam in the Storage Ring. Japanese Journal of Applied Physics, 22. doi:10.1143/jjap.22.l677
Tomimasu, Takio (1962) Field Inhomogeneities of a Betatron Magnet. Japanese Journal of Applied Physics, 1 (6) 343-349 doi:10.1143/jjap.1.343
Takada, Hiroshi, Tsutsui, Yasumitsu, Tomimasu, Takio (1990) Influence of Synchrobetatron Resonance on Low-Energy Injection Beam with a Compact Storage Ring. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l1503
Ohyama, Hideaki, Suzuki, Toshiji, Nishi, Kazuhisa, Mitsuyu, Tsuneo, Tomimasu, Takio (1996) Free Electron Laser Annealing of Amorphous Silicon Carbide. Japanese Journal of Applied Physics, 35. doi:10.1143/jjap.35.l683
Takada, Hiroshi, Tsutsui, Yasumitsu, Tomimasu, Takio (1989) Effects of Increasing Injection Repetition Rate of Low-Energy Injection into a Compact Storage Ring. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l1304
Takada, Hiroshi, Tsutsui, Yasumitsu, Emura, Katsuji, Miura, Fujio, Suzawa, Chizuru, Masuda, Takato, Okazaki, Toru, Keishi, Tomohiro, Hosoda, Yoshikado, Tomimasu, Takio (1991) NIJI-III Compact Superconducting Electron Storage Ring. Japanese Journal of Applied Physics, 30. 1893-1898 doi:10.1143/jjap.30.1893
Tomimasu, Takio, Sugiyama, Suguru (1967) Stopping Power Ratios Used in Cavity Ionization Chamber. Japanese Journal of Applied Physics, 6 (6) 788-789 doi:10.1143/jjap.6.788
Nishi, Kazuhisa, Ohyama, Hideaki, Suzuki, Toshiji, Mitsuyu, Tsuneo, Tomimasu, Takio (1997) Measurement of Semiconductor Heterojunction Band Discontinuities Using Free Electron Laser. Japanese Journal of Applied Physics, 36. 1795-1798 doi:10.1143/jjap.36.1795
 
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