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Kishimura, Shinji, Yamaguchi, Atsumi, Nagata, Hitoshi (1989) Effect of the Structure of a Photoactive Compound on the Dissolution Inhibition Effect. Japanese Journal of Applied Physics, 28. 2110-2113 doi:10.1143/jjap.28.2110

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Reference TypeJournal (article/letter/editorial)
TitleEffect of the Structure of a Photoactive Compound on the Dissolution Inhibition Effect
JournalJapanese Journal of Applied Physics
AuthorsKishimura, ShinjiAuthor
Yamaguchi, AtsumiAuthor
Nagata, HitoshiAuthor
Year1989 (October 20)Volume28
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.28.2110Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14993204Long-form Identifiermindat:1:5:14993204:4
GUID0
Full ReferenceKishimura, Shinji, Yamaguchi, Atsumi, Nagata, Hitoshi (1989) Effect of the Structure of a Photoactive Compound on the Dissolution Inhibition Effect. Japanese Journal of Applied Physics, 28. 2110-2113 doi:10.1143/jjap.28.2110
Plain TextKishimura, Shinji, Yamaguchi, Atsumi, Nagata, Hitoshi (1989) Effect of the Structure of a Photoactive Compound on the Dissolution Inhibition Effect. Japanese Journal of Applied Physics, 28. 2110-2113 doi:10.1143/jjap.28.2110
In(1989) Japanese Journal of Applied Physics Vol. 28. Japan Society of Applied Physics

See Also

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Yamaguchi, Atsumi, Kishimura, Shinji, Yamada, Yoshiaki, Nagata, Hitoshi (1991) Effect of Anion in Developer on Dissolution Characteristics of Photoresist. Japanese Journal of Applied Physics, 30. 195-199 doi:10.1143/jjap.30.195
Nagata, Hitoshi, Yamaguchi, Atsumi, Kawai, Akira (1995) Characterization of Thin-Film Interference Effect due to Surface Roughness. Japanese Journal of Applied Physics, 34. 3754-3758 doi:10.1143/jjap.34.3754
Yamaguchi, Atsuko, Takahashi, Makoto, Kishimura, Shinji, Matsuzawa, Nobuyuki, Ohfuji, Takeshi, Tanaka, Tomoaki, Tagawa, Seiichi, Sasago, Masaru (1999) Dissolution Rate Analysis of ArF Resists Based on the Percolation Model. Japanese Journal of Applied Physics, 38. 4033-4040 doi:10.1143/jjap.38.4033
Nagata, Hitoshi, Kawai, Akira (1989) Characteristics of Adhesion between Photoresist and Inorganic Substrate. Japanese Journal of Applied Physics, 28. 2137-2141 doi:10.1143/jjap.28.2137
Kawai, Akira, Nagata, Hitoshi, Takata, Masasuke (1994) Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior. Japanese Journal of Applied Physics, 33. doi:10.1143/jjap.33.l973
Hiraoka, Takeshi (1989) Effect of Pressure on the Hall Effect, Electrical Resistivity and Magnetoresistance in the High-TcSuperconductor, YBa2Cu3O7-δ. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l1135
Yamada, Yukio, Kasukabe, Yoshitaka, Nagata, Shinji, Yamaguchi, Sadae (1990) Spontaneous Hydrogenation of Ti Films Evaporated on NaCl Substrates I. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l1888
Yamada, Yukio, Kasukabe, Yoshitaka, Nagata, Shinji, Yamaguchi, Sadae (1992) Epitaxial Growth of Vanadium Films Evaporated on NaCl Substrates. Japanese Journal of Applied Physics, 31. 4010-4015 doi:10.1143/jjap.31.4010
Hirayama, Yoshiro, Saku, Tadashi, Horikoshi, Yoshiji (1989) Effect of Structure on Transport Characteristics of Ballistic One-Dimensional Channel. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l701
Shiraishi, Kensuke, Itoh, Hiroshi, Yoda, Osamu (1989) Ion Irradiation Effect on Ba2YCu3O7Superconductor. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l409
Takashima, Masayuki, Kumatoriya, Makoto, Fukami, Shinji, Unishi, Terunobu, Kano, Gentaro (1989) Device for Quick Evaluation of Meissner Effect. Japanese Journal of Applied Physics, 28. 2631-2632 doi:10.1143/jjap.28.2631
 
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