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Zhou, Nansheng, Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo (1990) Valence Band Electronic State of Transition-Metal Silicide TiSi2Studied by Soft X-Ray Emission Spectroscopy (SXES) Japanese Journal of Applied Physics, 29. 2014-2016 doi:10.1143/jjap.29.2014

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Reference TypeJournal (article/letter/editorial)
TitleValence Band Electronic State of Transition-Metal Silicide TiSi2Studied by Soft X-Ray Emission Spectroscopy (SXES)
JournalJapanese Journal of Applied Physics
AuthorsZhou, NanshengAuthor
Hirai, MasaakiAuthor
Kusaka, MasahikoAuthor
Iwami, MotohiroAuthor
Nakamura, HatsuoAuthor
Year1990 (October 20)Volume29
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.29.2014Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14994619Long-form Identifiermindat:1:5:14994619:5
GUID0
Full ReferenceZhou, Nansheng, Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo (1990) Valence Band Electronic State of Transition-Metal Silicide TiSi2Studied by Soft X-Ray Emission Spectroscopy (SXES) Japanese Journal of Applied Physics, 29. 2014-2016 doi:10.1143/jjap.29.2014
Plain TextZhou, Nansheng, Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo (1990) Valence Band Electronic State of Transition-Metal Silicide TiSi2Studied by Soft X-Ray Emission Spectroscopy (SXES) Japanese Journal of Applied Physics, 29. 2014-2016 doi:10.1143/jjap.29.2014
In(1990) Japanese Journal of Applied Physics Vol. 29. Japan Society of Applied Physics

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Watabe, Hirokuni, Iwami, Motohiro, Hirai, Masaaki, Kusaka, Masahiko, Nakamura, Hatsuo (1991) Soft X-Ray Emission Spectroscopy (SXES) Study of the Valence Band Electronic Structure of a Au-Si Alloy. Japanese Journal of Applied Physics, 30. 1928-1930 doi:10.1143/jjap.30.1928
Iwami, Motohiro, Nakamura, Hatsuo, Hirai, Masaaki, Kusaka, Masahiko, Azuma, Yuhko, Akao, Fumio (1990) Contribution of the SisElectronic State to the Density of State of CoSi2at Fermi Energy by Soft X-Ray Emission Spectroscopy. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l470
Kawamoto, Satoshi, Hirai, Masaaki, Kusaka, Masahiko, Nakamura, Hatsuo, Iwami, Motohiro, Watabe, Hirokuni (1993) Valence Band Density of States of Palladium Silicides Studied by X-Ray Emission Spectroscopy (XES) Japanese Journal of Applied Physics, 32. doi:10.1143/jjap.32.l597
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Heck, Claire, Kusaka, Masahiko, Hirai, Masaaki, Iwami, Motohiro, Nakamura, Hatsuo (1994) Study of Cr Silicide Formation on Si(100) Due to Solid-Phase Reaction Using Soft X-Ray Emission Spectroscopy. Japanese Journal of Applied Physics, 33. 6667-6670 doi:10.1143/jjap.33.6667
Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo, Murakami, Eiichi, Nakagawa, Kiyokazu (1991) Nondestructive Observation of Si0.5Ge0.5/Ge/Si1-xGexHeterostructure Using Soft X-Ray Emission Spectroscopy. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1653
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Yamauchi, Shoichi, Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo, Ohshima, Hisayoshi, Hattori, Tadashi (1994) Soft X-Ray Emission Spectroscopic Analysis of Pt Silicides ($\bf Pt_{2}Si$, PtSi) Japanese Journal of Applied Physics, 33. doi:10.1143/jjap.33.l1012
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Kasaya, Megumi, Yamauchi, Shoichi, Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo, Watabe, Hirokuni (1994) Valence Band Density of States of the Iron Silicides Studied by Soft X-Ray Emission Spectroscopy. Journal of the Physical Society of Japan, 63 (11). 4097-4101 doi:10.1143/jpsj.63.4097
Yamauchi, Shoichi, Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo, Yokota, Yasuhiro, Akiyama, Akitsugu, Watabe, Hirokuni (1993) Ni-Silicide Formation: Dependence on Crystallographic Orientation of Si Substrates. Japanese Journal of Applied Physics, 32. 3237-3246 doi:10.1143/jjap.32.3237
 
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