Sugino, Ken-ichi, Okazaki, Atsushi (1990) Low-Temperature Thermal Expansion of Silicon. Japanese Journal of Applied Physics, 29. 700-705 doi:10.1143/jjap.29.700
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Low-Temperature Thermal Expansion of Silicon | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Sugino, Ken-ichi | Author | |
| Okazaki, Atsushi | Author | ||
| Year | 1990 (April 20) | Volume | 29 |
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.29.700Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 14994920 | Long-form Identifier | mindat:1:5:14994920:2 |
| GUID | 0 | ||
| Full Reference | Sugino, Ken-ichi, Okazaki, Atsushi (1990) Low-Temperature Thermal Expansion of Silicon. Japanese Journal of Applied Physics, 29. 700-705 doi:10.1143/jjap.29.700 | ||
| Plain Text | Sugino, Ken-ichi, Okazaki, Atsushi (1990) Low-Temperature Thermal Expansion of Silicon. Japanese Journal of Applied Physics, 29. 700-705 doi:10.1143/jjap.29.700 | ||
| In | (1990) Japanese Journal of Applied Physics Vol. 29. Japan Society of Applied Physics | ||
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