Okada, Tatsuo, Nishimi, Akihiro, Maeda, Mitsuo (1991) Characteristics of Plasma-Enhanced Photoemission from Thin Films during Plasma-Assisted Chemical Vapor Deposition. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1591
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Characteristics of Plasma-Enhanced Photoemission from Thin Films during Plasma-Assisted Chemical Vapor Deposition | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Okada, Tatsuo | Author | |
Nishimi, Akihiro | Author | ||
Maeda, Mitsuo | Author | ||
Year | 1991 (September 1) | Volume | 30 |
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.30.l1591Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 14996831 | Long-form Identifier | mindat:1:5:14996831:9 |
GUID | 0 | ||
Full Reference | Okada, Tatsuo, Nishimi, Akihiro, Maeda, Mitsuo (1991) Characteristics of Plasma-Enhanced Photoemission from Thin Films during Plasma-Assisted Chemical Vapor Deposition. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1591 | ||
Plain Text | Okada, Tatsuo, Nishimi, Akihiro, Maeda, Mitsuo (1991) Characteristics of Plasma-Enhanced Photoemission from Thin Films during Plasma-Assisted Chemical Vapor Deposition. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1591 | ||
In | (1991) Japanese Journal of Applied Physics Vol. 30. Japan Society of Applied Physics |
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