| Reference Type | Journal (article/letter/editorial) |
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| Title | Fabrication of Thin Silicon Wires by Anisotropic Wet Etching of SOI Structures |
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| Journal | Japanese Journal of Applied Physics |
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| Authors | Itoh, Kazuo | Author |
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| Iwameji, Kazuaki | Author |
| Sasaki, Yoshisato | Author |
| Year | 1991 (September 1) | Volume | 30 |
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| Publisher | Japan Society of Applied Physics |
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| DOI | doi:10.1143/jjap.30.l1605Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 14996836 | Long-form Identifier | mindat:1:5:14996836:4 |
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|
| GUID | 0 |
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| Full Reference | Itoh, Kazuo, Iwameji, Kazuaki, Sasaki, Yoshisato (1991) Fabrication of Thin Silicon Wires by Anisotropic Wet Etching of SOI Structures. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1605 |
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| Plain Text | Itoh, Kazuo, Iwameji, Kazuaki, Sasaki, Yoshisato (1991) Fabrication of Thin Silicon Wires by Anisotropic Wet Etching of SOI Structures. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1605 |
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| In | (1991) Japanese Journal of Applied Physics Vol. 30. Japan Society of Applied Physics |
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