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Ohmori, Yutaka, Takahashi, Hiroyuki, Muro, Keiro, Uchida, Masao, Kawai, Tsuyoshi, Yoshino, Katsumi (1991) Gas-Sensitive Schottky Gated Field Effect Transistors Utilizing Poly(3-alkylthiophene) Films. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1778

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Reference TypeJournal (article/letter/editorial)
TitleGas-Sensitive Schottky Gated Field Effect Transistors Utilizing Poly(3-alkylthiophene) Films
JournalJapanese Journal of Applied Physics
AuthorsOhmori, YutakaAuthor
Takahashi, HiroyukiAuthor
Muro, KeiroAuthor
Uchida, MasaoAuthor
Kawai, TsuyoshiAuthor
Yoshino, KatsumiAuthor
Year1991 (October 1)Volume30
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.30.l1778Search in ResearchGate
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Mindat Ref. ID14996892Long-form Identifiermindat:1:5:14996892:0
GUID0
Full ReferenceOhmori, Yutaka, Takahashi, Hiroyuki, Muro, Keiro, Uchida, Masao, Kawai, Tsuyoshi, Yoshino, Katsumi (1991) Gas-Sensitive Schottky Gated Field Effect Transistors Utilizing Poly(3-alkylthiophene) Films. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1778
Plain TextOhmori, Yutaka, Takahashi, Hiroyuki, Muro, Keiro, Uchida, Masao, Kawai, Tsuyoshi, Yoshino, Katsumi (1991) Gas-Sensitive Schottky Gated Field Effect Transistors Utilizing Poly(3-alkylthiophene) Films. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1778
In(1991) Japanese Journal of Applied Physics Vol. 30. Japan Society of Applied Physics


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