Reference Type | Journal (article/letter/editorial) |
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Title | Selective Growth of GaAs/Si by One-Step Low-Pressure Metalorganic Chemical Vapor Deposition |
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Journal | Japanese Journal of Applied Physics |
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Authors | Sato, Kiyotaka | Author |
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Togura, Kenji | Author |
Year | 1991 (November 15) | Volume | 30 |
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Publisher | Japan Society of Applied Physics |
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DOI | doi:10.1143/jjap.30.l1964Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 14996958 | Long-form Identifier | mindat:1:5:14996958:3 |
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GUID | 0 |
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Full Reference | Sato, Kiyotaka, Togura, Kenji (1991) Selective Growth of GaAs/Si by One-Step Low-Pressure Metalorganic Chemical Vapor Deposition. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1964 |
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Plain Text | Sato, Kiyotaka, Togura, Kenji (1991) Selective Growth of GaAs/Si by One-Step Low-Pressure Metalorganic Chemical Vapor Deposition. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1964 |
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In | (1991) Japanese Journal of Applied Physics Vol. 30. Japan Society of Applied Physics |
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