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Muramatsu, Shin-ichi, Matsubara, Sunao, Watanabe, Takeshi, Shimada, Toshikazu, Kamiyama, Tomoaki, Suzuki, Kenji, Matsuda, Akihisa (1991) Classification of Inhomogeneities in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l2006

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Reference TypeJournal (article/letter/editorial)
TitleClassification of Inhomogeneities in Hydrogenated Amorphous Silicon
JournalJapanese Journal of Applied Physics
AuthorsMuramatsu, Shin-ichiAuthor
Matsubara, SunaoAuthor
Watanabe, TakeshiAuthor
Shimada, ToshikazuAuthor
Kamiyama, TomoakiAuthor
Suzuki, KenjiAuthor
Matsuda, AkihisaAuthor
Year1991 (December 1)Volume30
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.30.l2006Search in ResearchGate
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Mindat Ref. ID14996971Long-form Identifiermindat:1:5:14996971:2
GUID0
Full ReferenceMuramatsu, Shin-ichi, Matsubara, Sunao, Watanabe, Takeshi, Shimada, Toshikazu, Kamiyama, Tomoaki, Suzuki, Kenji, Matsuda, Akihisa (1991) Classification of Inhomogeneities in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l2006
Plain TextMuramatsu, Shin-ichi, Matsubara, Sunao, Watanabe, Takeshi, Shimada, Toshikazu, Kamiyama, Tomoaki, Suzuki, Kenji, Matsuda, Akihisa (1991) Classification of Inhomogeneities in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l2006
In(1991) Japanese Journal of Applied Physics Vol. 30. Japan Society of Applied Physics

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Watanabe, Takeshi, Tsuzuku, Susumu, Matsubara, Sunao, Muramatsu, Shin-ichi, Shimada, Toshikazu (1991) Reduction of Gap State Density in a-SiGe:H Alloys. Japanese Journal of Applied Physics, 30. 1641-1646 doi:10.1143/jjap.30.1641
Muramatsu, Shin-ichi, Shimada, Toshikazu, Kajiyama, Hiroshi, Azuma, Kazufumi, Watanabe, Takeshi, Kamiyama, Tomoaki, Suzuki, Kenji (1989) Medium-Range Order of Amorphous Silicon Germanium Alloys: Small-Angle X-Ray Scattering Study. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l1092
Könenkamp, Rolf, Muramatsu, Shin-ichi, Itoh, Haruo, Matsubara, Sunao, Shimada, Toshikazu (1990) Mobility-Lifetime Product in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l2155
Suzuki, Atsushi, Toyoshima, Yasutake, Mcelheny, Peter J., Matsuda, Akihisa (1991) In SituUltraviolet Laser Treatment during Plasma Deposition for the Improvement of Film Qualities in Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l790
Muramatsu, Shin-ichi, Nakamura, Nobuo, Matsubara, Sunao, Itoh, Haruo, Shimada, Toshikazu (1985) Preparation of High Purity a-Si:H Films and Their Light Soaking Effects. Japanese Journal of Applied Physics, 24. doi:10.1143/jjap.24.l744
Hayashi, Shigenobu, Hayamizu, Kikuko, Mashima, Satoshi, Suzuki, Atsushi, Mcelheny, Peter J., Yamasaki, Satoshi, Matsuda, Akihisa (1991) 1H Nuclear Magnetic Resonance Study of Hydrogen Distribution in Partially Deuterated Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l541
McElheny, Peter J., Suzuki, Atsushi, Mashima, Satoshi, Hasezaki, Kazuhiro, Yamasaki, Satoshi, Matsuda, Akihisa (1991) Structural Differences between Hydrogenated and Deuterated Amorphous Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l142
Itoh, Haruo, Matsubara, Sunao, Muramatsu, Shin-ichi, Nakamura, Nobuo, Shimada, Toshikazu, Shimotsu, Teruho (1988) Direct Observation of a-Si:H/a-Si1-xCx:H Multilayers and Their Electrical Properties. Japanese Journal of Applied Physics, 27. doi:10.1143/jjap.27.l24
Hayashi, Shigenobu, Hayamizu, Kikuko, Mashima, Satoshi, Suzuki, Atsushi, Mcelheny, Peter J., Yamasaki, Satoshi, Matsuda, Akihisa (1991) 2D and1H Nuclear Magnetic Resonance Study of Deuterated Amorphous Silicon and Partially Deuterated Hydrogenated Amorphous Silicon. Japanese Journal of Applied Physics, 30. 1909-1914 doi:10.1143/jjap.30.1909
Suzuki, Ryoichi, Kobayashi, Yoshinori, Mikado, Tomohisa, Matsuda, Akihisa, Mcelheny, Peter J., Mashima, Satoshi, Ohgaki, Hideaki, Chiwaki, Mitsukuni, Yamazaki, Tetsuo, Tomimasu, Takio (1991) Characterization of Hydrogenated Amorphous Silicon Films by a Pulsed Positron Beam. Japanese Journal of Applied Physics, 30. 2438-2441 doi:10.1143/jjap.30.2438
Shirai, Hajime, Hanna, Jun-ichi, Shimizu, Isamu (1991) Role of Atomic Hydrogen During Growth of Hydrogenated Amorphous Silicon in the “Chemical Annealing”. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l679
 
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