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Yabe, Hideki, Marumoto, Kenji, Aya, Sunao, Yoshioka, Nobuyuki, Fujino, Takeshi, Watakabe, Yaichiro, Matsui, Yasuji (1992) Sputtered W-Ti Film for X-Ray Mask Absorber. Japanese Journal of Applied Physics, 31. 4210-4214 doi:10.1143/jjap.31.4210

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Reference TypeJournal (article/letter/editorial)
TitleSputtered W-Ti Film for X-Ray Mask Absorber
JournalJapanese Journal of Applied Physics
AuthorsYabe, HidekiAuthor
Marumoto, KenjiAuthor
Aya, SunaoAuthor
Yoshioka, NobuyukiAuthor
Fujino, TakeshiAuthor
Watakabe, YaichiroAuthor
Matsui, YasujiAuthor
Year1992 (December 30)Volume31
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.31.4210Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14998097Long-form Identifiermindat:1:5:14998097:7
GUID0
Full ReferenceYabe, Hideki, Marumoto, Kenji, Aya, Sunao, Yoshioka, Nobuyuki, Fujino, Takeshi, Watakabe, Yaichiro, Matsui, Yasuji (1992) Sputtered W-Ti Film for X-Ray Mask Absorber. Japanese Journal of Applied Physics, 31. 4210-4214 doi:10.1143/jjap.31.4210
Plain TextYabe, Hideki, Marumoto, Kenji, Aya, Sunao, Yoshioka, Nobuyuki, Fujino, Takeshi, Watakabe, Yaichiro, Matsui, Yasuji (1992) Sputtered W-Ti Film for X-Ray Mask Absorber. Japanese Journal of Applied Physics, 31. 4210-4214 doi:10.1143/jjap.31.4210
In(1992) Japanese Journal of Applied Physics Vol. 31. Japan Society of Applied Physics

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Fujino, Takeshi, Sasaki, Kei, Marumoto, Kenji, Yabe, Hideki, Yoshioka, Nobuyuki, Watakabe, Yaichiro (1992) X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber. Japanese Journal of Applied Physics, 31. 4086-4090 doi:10.1143/jjap.31.4086
Marumoto, Kenji, Yabe, Hideki, Aya, Sunao, Matsuba, Motoko, Sasaki, Kei, Watakabe, Yaichiro, Matsui, Yasuji (1993) Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas. Japanese Journal of Applied Physics, 32. 5918-5923 doi:10.1143/jjap.32.5918
Aya, Sunao, Moriizumi, Kouichi, Fujino, Takeshi, Kamiyama, Kinya, Minami, Hiroyuki, Kise, Koji, Yabe, Hideki, Marumoto, Kenji, Matsui, Yasuji (1994) Proximity Effect Correction for 1:1 X-Ray Mask Fabrication. Japanese Journal of Applied Physics, 33. 6976-6982 doi:10.1143/jjap.33.6976
Watanabe, Hiroshi, Kikuchi, Yukiko, Marumoto, Kenji, Matsui, Yasuji, Yabe, Hideki, Aya, Sunao, Okada, Ikuo, Takeuchi, Nobuyuki (1999) Studies on Defect Inspectability and Printability Using Programmed-Defect X-Ray Mask. Japanese Journal of Applied Physics, 38. 7084-7089 doi:10.1143/jjap.38.7084
Aya, Sunao, Marumoto, Kenji, Yabe, Hideki, Matsui, Yasuji (1993) Improvement of Pattern and Position Accuracies by Multiple Electron Beam Writing for X-Ray Mask Fabrication. Japanese Journal of Applied Physics, 32. doi:10.1143/jjap.32.l1707
Kise, Koji, Aya, Sunao, Yabe, Hideki, Marumoto, Kenji, Hifumi, Takasi, Matsui, Yasuji (1995) Electron Beam Writing Techniques for Fabricating Highly Accurate X-Ray Masks. Japanese Journal of Applied Physics, 34. 6738-6742 doi:10.1143/jjap.34.6738
Kitamura, Kaeko, Yabe, Hideki, Ami, Shigeto, Kise, Koji, Aya, Sunao, Marumoto, Kenji, Satoh, Shin-ichi (1999) Stress Stability of W–Ti X-Ray Absorber in Patterning Process. Japanese Journal of Applied Physics, 38. 7080-7083 doi:10.1143/jjap.38.7080
Kitamura, Kaeko, Yabe, Hideki, Sasaki, Kei, Ami, Shigeto, Kise, Koji, Aya, Sunao, Marumoto, Kenji (1997) A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask. Japanese Journal of Applied Physics, 36. 7575-7579 doi:10.1143/jjap.36.7575
Marumoto, Kenji, Yabe, Hideki, Matsui, Yasuji, Yamashita, Hiroaki, Kikuchi, Noribumi (1992) Fabrication of Diamond Membranes for X-Ray Masks by Hot-Filament Method. Japanese Journal of Applied Physics, 31. 4205-4209 doi:10.1143/jjap.31.4205
Aya, Sunao, Kise, Koji, Yabe, Hideki, Marumoto, Kenji (1996) Validity of Double and Triple Gaussian Functions for Proximity Effect Correction in X-ray Mask Writing. Japanese Journal of Applied Physics, 35. 1929-1936 doi:10.1143/jjap.35.1929
Fujino, Takeshi, Hashimoto, Motoko, Yoshioka, Nobuyuki, Moriizumi, Koichi, Satou, Tetsuo, Morimoto, Hiroaki, Watakabe, Yaichiro (1991) Fabrication of 0.25-µm Patterns on a Membrane Substrate-Based X-Ray Absorber. Japanese Journal of Applied Physics, 30. 3058-3064 doi:10.1143/jjap.30.3058
 
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