Reference Type | Journal (article/letter/editorial) |
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Title | Undoped Silicon Layers Grown by Gas Source Molecular Beam Epitaxy Using Si2H6 |
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Journal | Japanese Journal of Applied Physics |
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Authors | Yoshinobu, Tatsuo | Author |
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Fuyuki, Takashi | Author |
Matsunami, Hiroyuki | Author |
Year | 1992 (September 1) | Volume | 31 |
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Publisher | Japan Society of Applied Physics |
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DOI | doi:10.1143/jjap.31.l1213Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 14998369 | Long-form Identifier | mindat:1:5:14998369:5 |
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GUID | 0 |
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Full Reference | Yoshinobu, Tatsuo, Fuyuki, Takashi, Matsunami, Hiroyuki (1992) Undoped Silicon Layers Grown by Gas Source Molecular Beam Epitaxy Using Si2H6. Japanese Journal of Applied Physics, 31. doi:10.1143/jjap.31.l1213 |
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Plain Text | Yoshinobu, Tatsuo, Fuyuki, Takashi, Matsunami, Hiroyuki (1992) Undoped Silicon Layers Grown by Gas Source Molecular Beam Epitaxy Using Si2H6. Japanese Journal of Applied Physics, 31. doi:10.1143/jjap.31.l1213 |
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In | (1992) Japanese Journal of Applied Physics Vol. 31. Japan Society of Applied Physics |
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