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Shiraishi, Masayuki, Ishiyama, Wakana, Oshino, Tetsuya, Murakami, Katsuhiko (2000) Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 39. 6810-6814 doi:10.1143/jjap.39.6810

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Reference TypeJournal (article/letter/editorial)
TitleLow-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography
JournalJapanese Journal of Applied Physics
AuthorsShiraishi, MasayukiAuthor
Ishiyama, WakanaAuthor
Oshino, TetsuyaAuthor
Murakami, KatsuhikoAuthor
Year2000 (December 30)Volume39
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.39.6810Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15014804Long-form Identifiermindat:1:5:15014804:5
GUID0
Full ReferenceShiraishi, Masayuki, Ishiyama, Wakana, Oshino, Tetsuya, Murakami, Katsuhiko (2000) Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 39. 6810-6814 doi:10.1143/jjap.39.6810
Plain TextShiraishi, Masayuki, Ishiyama, Wakana, Oshino, Tetsuya, Murakami, Katsuhiko (2000) Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 39. 6810-6814 doi:10.1143/jjap.39.6810
In(2000) Japanese Journal of Applied Physics Vol. 39. Japan Society of Applied Physics

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Shiraishi, Masayuki, Oshino, Tetsuya, Murakami, Katsuhiko, Chiba, Hiroshi (2011) Improvement of Flare Modeling and Derivation for Extreme Ultraviolet Optics. Japanese Journal of Applied Physics, 50 (6) 6 doi:10.1143/jjap.50.06gb04
Shiraishi, Masayuki, Oshino, Tetsuya, Murakami, Katsuhiko, Chiba, Hiroshi (2011) Improvement of Flare Modeling and Derivation for Extreme Ultraviolet Optics. Japanese Journal of Applied Physics, 50 (6) 6 doi:10.7567/jjap.50.06gb04
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Murakami, Katsuhiko, Oshino, Tetsuya, Kinoshita, Hiroo, Watanabe, Takeo, Niibe, Masato, Ito, Masaaki, Oizumi, Hiroaki, Yamanashi, Hiromasa (1998) Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors. Japanese Journal of Applied Physics, 37. 6750-6755 doi:10.1143/jjap.37.6750
Murakami, Katsuhiko, Oshino, Tetsuya, Nakamura, Hiroshi, Ohtani, Masayuki, Nagata, Hiroshi (1992) Normal-Incidence X-Ray Microscope for Carbon Kα Radiation with 0.5 µm Resolution. Japanese Journal of Applied Physics, 31. doi:10.1143/jjap.31.l1500
Nagata, Shin’ichi, Tsuneta, Saku, Sakao, Taro, Yoshida, Tsuyoshi, Hara, Hirohisa, Kano, Ryouhei, Ishiyama, Wakana, Murakami, Katsuhiko, Ohtan, Masayuki (1997) High-wavelength-resolution extreme-ultraviolet multilayer mirror. Applied Optics, 36. 2830pp. doi:10.1364/ao.36.002830
Oshino, Tetsuya, Murakami, Katsuhiko, Nakamura, Hiroshi, Ohtani, Masayuki, Nagata, Hiroshi (1994) Improvement of the Uniformity of Tungsten/Carbon Multilayers by Thermal Processing. Japanese Journal of Applied Physics, 33. 280-284 doi:10.1143/jjap.33.280
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