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Nakamatsu, Ken-ichiro, Matsui, Shinji (2006) Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l546

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Reference TypeJournal (article/letter/editorial)
TitleNanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane
JournalJapanese Journal of Applied Physics
AuthorsNakamatsu, Ken-ichiroAuthor
Matsui, ShinjiAuthor
Year2006 (May 26)Volume45
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.45.l546Search in ResearchGate
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Mindat Ref. ID15026704Long-form Identifiermindat:1:5:15026704:3
GUID0
Full ReferenceNakamatsu, Ken-ichiro, Matsui, Shinji (2006) Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l546
Plain TextNakamatsu, Ken-ichiro, Matsui, Shinji (2006) Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l546
In(2006) Japanese Journal of Applied Physics Vol. 45. Japan Society of Applied Physics

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Kawamori, Masanori, Nakamatsu, Ken-ichiro, Haruyama, Yuichi, Matsui, Shinji (2006) Effect of Oxygen Plasma Irradiation on Hydrogen Silsesquioxane Nanopatterns Replicated by Room-Temperature Nanoimprinting. Japanese Journal of Applied Physics, 45 (11) 8994-8996 doi:10.1143/jjap.45.8994
Nakamatsu, Ken-ichiro, Ishikawa, Kiyoshi, Taneichi, Noriaki, Matsui, Shinji (2007) Room-Temperature Nanoimprinting Using Ladder Hydrogen Silsesquioxane. Japanese Journal of Applied Physics, 46 (8) 5388-5390 doi:10.1143/jjap.46.5388
Nakamatsu, Ken-ichiro, Okada, Makoto, Matsui, Shinji (2008) Fabrication of High-Aspect Si Structures by Deep Reactive Ion Etching Using Hydrogen Silsesquioxane Masks Replicated by Room Temperature Nanoimprinting. Japanese Journal of Applied Physics, 47 (11) 8619-8621 doi:10.1143/jjap.47.8619
Nakamatsu, Ken-ichiro, Tone, Katsuhiko, Matsui, Shinji (2006) Room-Temperature Nanoimprint Lithography Using Photosensitive Dry Film. Japanese Journal of Applied Physics, 45 (5) 4290-4292 doi:10.1143/jjap.45.4290
Nakamatsu, Ken-ichiro, Yamada, Noriko, Kanda, Kazuhiro, Haruyama, Yuichi, Matsui, Shinji (2006) Fluorinated Diamond-Like Carbon Coating as Antisticking Layer on Nanoimprint Mold. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l954
Kang, Yuji, Okada, Makoto, Minari, Chiaki, Kanda, Kazuhiro, Haruyama, Yuichi, Matsui, Shinji (2010) Room-Temperature Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane with Hard Poly(dimethylsiloxane) Mold. Japanese Journal of Applied Physics, 49 (6) 6 doi:10.1143/jjap.49.06gl13
Nakamatsu, Ken-ichiro, Tone, Katsuhiko, Matsui, Shinji (2005) Nanoimprint and Lift-Off Process Using Poly(vinyl alcohol) Japanese Journal of Applied Physics, 44 (11) 8186-8188 doi:10.1143/jjap.44.8186
Nakamatsu, Ken-ichiro, Nagase, Masao, Namatsu, Hideo, Matsui, Shinji (2005) Mechanical Characteristics of Diamond-Like-Carbon Nanosprings Fabricated by Focused-Ion-Beam Chemical Vapor Deposition. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1228
Okada, Makoto, Nakamatsu, Ken-ichiro, Kang, Yuji, Kanda, Kazuhiro, Haruyama, Yuichi, Matsui, Shinji (2009) Characteristics of Antisticking Layer Formed by CHF3Plasma Irradiation for Nanoimprint Molds. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fh15
Nakamatsu, Ken-ichiro, Ichihashi, Toshinari, Kanda, Kazuhiro, Haruyama, Yuichi, Kaito, Takashi, Matsui, Shinji (2009) Nanostructure Analysis of Nanosprings Fabricated by Focused-Ion-Beam Chemical Vapor Deposition. Japanese Journal of Applied Physics, 48 (10) 105001 doi:10.1143/jjap.48.105001
Nagase, Masao, Nakamatsu, Kenichiro, Matsui, Shinji, Namatsu, Hideo, Yamaguchi, Hiroshi (2006) Carbon Multiprobe on a Si Cantilever for Pseudo-Metal–Oxide–Semiconductor Field-Effect-Transistor. Japanese Journal of Applied Physics, 45 (3) 2009-2013 doi:10.1143/jjap.45.2009
 
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