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Ooka, Masahiro, Yokoyama, Shin (2006) Effect of H2Addition during Cu Thin-Film Sputtering. Japanese Journal of Applied Physics, 45 (12) 9058-9062 doi:10.1143/jjap.45.9058

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Reference TypeJournal (article/letter/editorial)
TitleEffect of H2Addition during Cu Thin-Film Sputtering
JournalJapanese Journal of Applied Physics
AuthorsOoka, MasahiroAuthor
Yokoyama, ShinAuthor
Year2006 (December 7)Volume45
Issue12
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.45.9058Search in ResearchGate
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Mindat Ref. ID15027311Long-form Identifiermindat:1:5:15027311:2
GUID0
Full ReferenceOoka, Masahiro, Yokoyama, Shin (2006) Effect of H2Addition during Cu Thin-Film Sputtering. Japanese Journal of Applied Physics, 45 (12) 9058-9062 doi:10.1143/jjap.45.9058
Plain TextOoka, Masahiro, Yokoyama, Shin (2006) Effect of H2Addition during Cu Thin-Film Sputtering. Japanese Journal of Applied Physics, 45 (12) 9058-9062 doi:10.1143/jjap.45.9058
In(2006, December) Japanese Journal of Applied Physics Vol. 45 (12) Japan Society of Applied Physics

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Ooka, Masahiro, Yokoyama, Shin (2004) SiO2Hole Etching Using Perfluorocarbon Alternative Gas with Small Global Greenhouse Effect. Japanese Journal of Applied Physics, 43 (6) 3586-3589 doi:10.1143/jjap.43.3586
Ooka, Masahiro, Yokoyama, Shin (2005) Contact-Hole Etching with NH3-Added C5F8Pulse-Modulated Plasma. Japanese Journal of Applied Physics, 44 (9) 6476-6480 doi:10.1143/jjap.44.6476
Masuda, Yoichiro, Echizen, Masahiro (2006) Polarization Reversal Property of Ferroelectric Thin Film for Ferroelectric Memories. Japanese Journal of Applied Physics, 45 (2) 817-821 doi:10.1143/jjap.45.817
Yamada, So, Yokoyama, Shin, Koyanagi, Mitsumasa (1990) Two-Dimensional Device Simulation for Polycrystalline Silicon Thin-Film Transistor. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l2388
Ohkuma, Haruo, Mochiku, Takashi, Kanke, Yoko, Wen, Zhongmin, Yokoyama, Shin, Asano, Hajime, Iguchi, Ienari, Yamaka, Eiso (1987) Preparation of Y-Ba-Cu-O Thin Films by Rf-Magnetron Sputtering. Japanese Journal of Applied Physics, 26. doi:10.1143/jjap.26.l1484
Kuroda, Ken'ichi, Kojima, Kazuyoshi, Yokoyama, Kazuo, Hamanaka, Koichi (1990) Effect of Growth Temperature on Superconducting Phases of As-Grown BiSrCaCuO Thin Film Formed by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l2033
Yokoyama, Shin, Ichikawa, Hiroshi, Koyanagi, Mitsumasa (1993) Influence of Sputtering Geometry on Crystallinity of Al(110) Thin Films on Offset (100)Si. Japanese Journal of Applied Physics, 32. doi:10.1143/jjap.32.l283
Suemori, Kouji, Matsumura, Yoshio, Yokoyama, Masaaki, Hiramoto, Masahiro (2006) Large Area Organic Solar Cells with Thick and Transparent Protection Layers. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l472
Kumar, Pushpendra, Malhotra, Lalit Kumar (2006) Effect of Palladium Overlayer on Samarium Hydride Thin Film Switchable Mirror: Electrochemical and Topographical Study. Japanese Journal of Applied Physics, 45 (12) 9094-9099 doi:10.1143/jjap.45.9094
Keum, Min-Jong, Kim, Kyung-Hwan (2006) Transparent Conductive Thin Film for Top Emitting Organic Light Emitting Diodes by Sputtering Method. Japanese Journal of Applied Physics, 45 (10) 8462-8465 doi:10.1143/jjap.45.8462
Kato, Takahiko, Doi, Toshiya, Kumagai, Teruo, Matsuda, Shin-Pei (1988) Superconducting Bi-Sr-Ca-Cu-O Thin Films by Sputtering. Japanese Journal of Applied Physics, 27. doi:10.1143/jjap.27.l1097
 
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