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Okimura, Kunio, Sasakawa, Yusuke, Nihei, Yusuke (2006) X-ray Diffraction Study of Electric Field-Induced Metal–Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate. Japanese Journal of Applied Physics, 45 (12) 9200-9202 doi:10.1143/jjap.45.9200

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Reference TypeJournal (article/letter/editorial)
TitleX-ray Diffraction Study of Electric Field-Induced Metal–Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate
JournalJapanese Journal of Applied Physics
AuthorsOkimura, KunioAuthor
Sasakawa, YusukeAuthor
Nihei, YusukeAuthor
Year2006 (December 7)Volume45
Issue12
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.45.9200Search in ResearchGate
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Mindat Ref. ID15027342Long-form Identifiermindat:1:5:15027342:6
GUID0
Full ReferenceOkimura, Kunio, Sasakawa, Yusuke, Nihei, Yusuke (2006) X-ray Diffraction Study of Electric Field-Induced Metal–Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate. Japanese Journal of Applied Physics, 45 (12) 9200-9202 doi:10.1143/jjap.45.9200
Plain TextOkimura, Kunio, Sasakawa, Yusuke, Nihei, Yusuke (2006) X-ray Diffraction Study of Electric Field-Induced Metal–Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate. Japanese Journal of Applied Physics, 45 (12) 9200-9202 doi:10.1143/jjap.45.9200
In(2006, December) Japanese Journal of Applied Physics Vol. 45 (12) Japan Society of Applied Physics

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Okimura, Kunio, Ezreena, Nurul, Sasakawa, Yusuke, Sakai, Joe (2009) Electric-Field-Induced Multistep Resistance Switching in Planar VO2/c-Al2O3Structure. Japanese Journal of Applied Physics, 48 (6) 65003 doi:10.1143/jjap.48.065003
Okimura, Kunio, Sakai, Joe (2007) Time-dependent Characteristics of Electric Field-induced Metal–Insulator Transition of Planer VO2/c-Al2O3Structure. Japanese Journal of Applied Physics, 46. doi:10.1143/jjap.46.l813
Okimura, Kunio, Kubo, Naotaka (2005) Preparation of VO2Films with Metal-Insulator Transition on Sapphire and Silicon Substrates by Inductively Coupled Plasma-Assisted Sputtering. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1150
Okimura, K., Ezreena, N., Sakai, J. (2008) X-ray diffraction study on structures of vanadium dioxide films with metal–insulator transition. Acta Crystallographica Section A Foundations of Crystallography, 64. doi:10.1107/s0108767308096712
Okimura, Kunio, Sakai, Joe (2009) Changes in Lattice Parameters of VO2Films Grown onc-Plane Al2O3Substrates across Metal–Insulator Transition. Japanese Journal of Applied Physics, 48 (4) 45504 doi:10.1143/jjap.48.045504
Okimura, Kunio, Sakai, Joe, Ramanathan, Shriram (2010) In situ x-ray diffraction studies on epitaxial VO2 films grown on c-Al2O3 during thermally induced insulator-metal transition. Journal of Applied Physics, 107 (6). 63503pp. doi:10.1063/1.3327422
Azhan, Nurul Hanis, Su, Kui, Okimura, Kunio, Sakai, Joe (2015) Radio frequency substrate biasing effects on the insulator-metal transition behavior of reactively sputtered VO2 films on sapphire (001). Journal of Applied Physics, 117 (18). 185307pp. doi:10.1063/1.4921105
Tanaka, Hiroyuki, Yun, Young, Shirakawa, Yusuke, Maki, Tetsuro, Kobayashi, Takeshi (1998) Improved Stability of Metal-Insulator-Diamond Semiconductor Interface by Employing BaF2 Insulator Film. Japanese Journal of Applied Physics, 37. doi:10.1143/jjap.37.l1444
Ro, Jae-Sang, Hong, Won-Eui (2006) Joule-Heating-Induced Annealing by Applying Electric Field Directly to Intrinsic Silicon Film. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l1142
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Ishiguro, Takashi (1991) Determination of Pole Distribution for Thin Film on a Thick Substrate by X-Ray Diffraction. Japanese Journal of Applied Physics, 30. 1515-1520 doi:10.1143/jjap.30.1515
 
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