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Nakazawa, Hideki, Asai, Yuhki, Kinoshita, Takeshi, Suemitsu, Maki, Abe, Toshimi, Yasui, Kanji, Itoh, Takashi, Endoh, Tetsuo, Narita, Yuzuru, Konno, Atsushi, Enta, Yoshiharu, Mashita, Masao (2008) Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source. Japanese Journal of Applied Physics, 47 (11) 8491-8497 doi:10.1143/jjap.47.8491

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Reference TypeJournal (article/letter/editorial)
TitleThin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source
JournalJapanese Journal of Applied Physics
AuthorsNakazawa, HidekiAuthor
Asai, YuhkiAuthor
Kinoshita, TakeshiAuthor
Suemitsu, MakiAuthor
Abe, ToshimiAuthor
Yasui, KanjiAuthor
Itoh, TakashiAuthor
Endoh, TetsuoAuthor
Narita, YuzuruAuthor
Konno, AtsushiAuthor
Enta, YoshiharuAuthor
Mashita, MasaoAuthor
Year2008 (November 14)Volume47
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.47.8491Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15031257Long-form Identifiermindat:1:5:15031257:6
GUID0
Full ReferenceNakazawa, Hideki, Asai, Yuhki, Kinoshita, Takeshi, Suemitsu, Maki, Abe, Toshimi, Yasui, Kanji, Itoh, Takashi, Endoh, Tetsuo, Narita, Yuzuru, Konno, Atsushi, Enta, Yoshiharu, Mashita, Masao (2008) Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source. Japanese Journal of Applied Physics, 47 (11) 8491-8497 doi:10.1143/jjap.47.8491
Plain TextNakazawa, Hideki, Asai, Yuhki, Kinoshita, Takeshi, Suemitsu, Maki, Abe, Toshimi, Yasui, Kanji, Itoh, Takashi, Endoh, Tetsuo, Narita, Yuzuru, Konno, Atsushi, Enta, Yoshiharu, Mashita, Masao (2008) Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source. Japanese Journal of Applied Physics, 47 (11) 8491-8497 doi:10.1143/jjap.47.8491
In(2008, November) Japanese Journal of Applied Physics Vol. 47 (11) Japan Society of Applied Physics

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Narita, Yuzuru, Konno, Atsushi, Nakazawa, Hideki, Itoh, Takashi, Yasui, Kanji, Endoh, Tetsuo, Suemitsu, Maki (2007) Hydrogen-Controlled Crystallinity of 3C-SiC Film on Si(001) Grown with Monomethylsilane. Japanese Journal of Applied Physics, 46. doi:10.1143/jjap.46.l40
Nakazawa, Hideki, Miura, Soushi, Kamata, Ryosuke, Okuno, Saori, Enta, Yoshiharu, Suemitsu, Maki, Abe, Toshimi (2012) Characteristics of Silicon/Nitrogen-Incorporated Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 51 (1) 15603 doi:10.1143/jjap.51.015603
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Nakazawa, Hideki, Mikami, Takamasa, Enta, Yoshiharu, Suemitsu, Maki, Mashita, Masao (2003) Structure, Chemical Bonding and These Thermal Stabilities of Diamond-Like Carbon (DLC) Films by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 42. doi:10.1143/jjap.42.l676
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