Wu, You-Lin, Huang, Chiung-Yi, Liang, Cheng-Hsun (2009) Improvement in the Cumulative Failure Distribution of High-kDielectric Subjected to Nanoscale Stress by D2Post-Deposition Annealing. Japanese Journal of Applied Physics, 48 (11) 111403 doi:10.1143/jjap.48.111403
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Improvement in the Cumulative Failure Distribution of High-kDielectric Subjected to Nanoscale Stress by D2Post-Deposition Annealing | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Wu, You-Lin | Author | |
Huang, Chiung-Yi | Author | ||
Liang, Cheng-Hsun | Author | ||
Year | 2009 (November 20) | Volume | 48 |
Issue | 11 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.48.111403Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15033058 | Long-form Identifier | mindat:1:5:15033058:7 |
GUID | 0 | ||
Full Reference | Wu, You-Lin, Huang, Chiung-Yi, Liang, Cheng-Hsun (2009) Improvement in the Cumulative Failure Distribution of High-kDielectric Subjected to Nanoscale Stress by D2Post-Deposition Annealing. Japanese Journal of Applied Physics, 48 (11) 111403 doi:10.1143/jjap.48.111403 | ||
Plain Text | Wu, You-Lin, Huang, Chiung-Yi, Liang, Cheng-Hsun (2009) Improvement in the Cumulative Failure Distribution of High-kDielectric Subjected to Nanoscale Stress by D2Post-Deposition Annealing. Japanese Journal of Applied Physics, 48 (11) 111403 doi:10.1143/jjap.48.111403 | ||
In | (2009, November) Japanese Journal of Applied Physics Vol. 48 (11) Japan Society of Applied Physics |
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