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Nihei, Ryota, Usami, Noritaka, Nakajima, Kazuo (2009) Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content. Japanese Journal of Applied Physics, 48 (11) 115507 doi:10.1143/jjap.48.115507

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Reference TypeJournal (article/letter/editorial)
TitleGrowth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content
JournalJapanese Journal of Applied Physics
AuthorsNihei, RyotaAuthor
Usami, NoritakaAuthor
Nakajima, KazuoAuthor
Year2009 (November 20)Volume48
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.48.115507Search in ResearchGate
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Mindat Ref. ID15033102Long-form Identifiermindat:1:5:15033102:7
GUID0
Full ReferenceNihei, Ryota, Usami, Noritaka, Nakajima, Kazuo (2009) Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content. Japanese Journal of Applied Physics, 48 (11) 115507 doi:10.1143/jjap.48.115507
Plain TextNihei, Ryota, Usami, Noritaka, Nakajima, Kazuo (2009) Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content. Japanese Journal of Applied Physics, 48 (11) 115507 doi:10.1143/jjap.48.115507
In(2009, November) Japanese Journal of Applied Physics Vol. 48 (11) Japan Society of Applied Physics


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