Nihei, Ryota, Usami, Noritaka, Nakajima, Kazuo (2009) Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content. Japanese Journal of Applied Physics, 48 (11) 115507 doi:10.1143/jjap.48.115507
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Nihei, Ryota | Author | |
Usami, Noritaka | Author | ||
Nakajima, Kazuo | Author | ||
Year | 2009 (November 20) | Volume | 48 |
Issue | 11 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.48.115507Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15033102 | Long-form Identifier | mindat:1:5:15033102:7 |
GUID | 0 | ||
Full Reference | Nihei, Ryota, Usami, Noritaka, Nakajima, Kazuo (2009) Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content. Japanese Journal of Applied Physics, 48 (11) 115507 doi:10.1143/jjap.48.115507 | ||
Plain Text | Nihei, Ryota, Usami, Noritaka, Nakajima, Kazuo (2009) Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content. Japanese Journal of Applied Physics, 48 (11) 115507 doi:10.1143/jjap.48.115507 | ||
In | (2009, November) Japanese Journal of Applied Physics Vol. 48 (11) Japan Society of Applied Physics |
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