Dao, Vinh Ai, Duy, Nguyen Van, Heo, Jongkyu, Choi, Hyungwook, Kim, Youngkuk, Lakshminarayan, Lakshminarayan, Yi, Junsin (2009) Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon. Japanese Journal of Applied Physics, 48 (6) 66509 doi:10.1143/jjap.48.066509
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Dao, Vinh Ai | Author | |
| Duy, Nguyen Van | Author | ||
| Heo, Jongkyu | Author | ||
| Choi, Hyungwook | Author | ||
| Kim, Youngkuk | Author | ||
| Lakshminarayan, Lakshminarayan | Author | ||
| Yi, Junsin | Author | ||
| Year | 2009 (June 22) | Volume | 48 |
| Issue | 6 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.48.066509Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15033905 | Long-form Identifier | mindat:1:5:15033905:4 |
| GUID | 0 | ||
| Full Reference | Dao, Vinh Ai, Duy, Nguyen Van, Heo, Jongkyu, Choi, Hyungwook, Kim, Youngkuk, Lakshminarayan, Lakshminarayan, Yi, Junsin (2009) Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon. Japanese Journal of Applied Physics, 48 (6) 66509 doi:10.1143/jjap.48.066509 | ||
| Plain Text | Dao, Vinh Ai, Duy, Nguyen Van, Heo, Jongkyu, Choi, Hyungwook, Kim, Youngkuk, Lakshminarayan, Lakshminarayan, Yi, Junsin (2009) Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon. Japanese Journal of Applied Physics, 48 (6) 66509 doi:10.1143/jjap.48.066509 | ||
| In | (2009, June) Japanese Journal of Applied Physics Vol. 48 (6) Japan Society of Applied Physics | ||
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