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Ohnishi, Ryuji, Watanabe, Takeo, Fukushima, Yasuyuki, Osugi, Masafumi, Kinoshita, Hiroo (2009) Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fa08

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Reference TypeJournal (article/letter/editorial)
TitleTransmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist
JournalJapanese Journal of Applied Physics
AuthorsOhnishi, RyujiAuthor
Watanabe, TakeoAuthor
Fukushima, YasuyukiAuthor
Osugi, MasafumiAuthor
Kinoshita, HirooAuthor
Year2009 (June 22)Volume48
Issue6
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.48.06fa08Search in ResearchGate
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Mindat Ref. ID15033923Long-form Identifiermindat:1:5:15033923:8
GUID0
Full ReferenceOhnishi, Ryuji, Watanabe, Takeo, Fukushima, Yasuyuki, Osugi, Masafumi, Kinoshita, Hiroo (2009) Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fa08
Plain TextOhnishi, Ryuji, Watanabe, Takeo, Fukushima, Yasuyuki, Osugi, Masafumi, Kinoshita, Hiroo (2009) Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fa08
In(2009, June) Japanese Journal of Applied Physics Vol. 48 (6) Japan Society of Applied Physics

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Watanabe, Takeo, Fukushima, Yasuyuki, Shiotani, Hideaki, Ohnishi, Ryuji, Suzuki, Shota, Kinoshita, Hiroo, Yusa, Shinichi (2007) Extreme Ultraviolet Resist Development at the University of Hyogo. Japanese Journal of Applied Physics, 46 (9) 6118-6123 doi:10.1143/jjap.46.6118
Osugi, Masafumi, Tanaka, Kazuumi, Sakaya, Noriyuki, Hamamoto, Kazuhiro, Watanabe, Takeo, Kinoshita, Hiroo (2008) Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter. Japanese Journal of Applied Physics, 47 (6) 4872-4877 doi:10.1143/jjap.47.4872
Fukushima, Yasuyuki, Watanabe, Takeo, Ohnishi, Ryuji, Shiotani, Hideaki, Suzuki, Shouta, Hayakawa, Masamichi, Ogi, Satoshi, Endo, Yusuke, Yamanaka, Tomotaka, Yusa, Shinichi, Kinoshita, Hiroo (2007) Development of Low Line Edge Roughness and Highly Sensitive Resist for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 46 (9) 6198-6201 doi:10.1143/jjap.46.6198
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Watanabe, Takeo, Hamamoto, Kazuhiro, Kinoshita, Hiroo, Hada, Hideo, Komano, Hiroshi (2004) Resist Outgassing Characteristics in Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 43 (6) 3713-3717 doi:10.1143/jjap.43.3713
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Harada, Tetsuo, Nakasuji, Masato, Tada, Masaki, Nagata, Yutaka, Watanabe, Takeo, Kinoshita, Hiroo (2011) Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU. Japanese Journal of Applied Physics, 50 (6) 6 doi:10.1143/jjap.50.06gb03
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Yamaguchi, Yuya, Fukushima, Yasuyuki, Harada, Tetsuo, Watanabe, Takeo, Kinoshita, Hiroo (2011) Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below. Japanese Journal of Applied Physics, 50 (6) 6 doi:10.1143/jjap.50.06gb10
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