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Nakagawa, Masaru, Kamata, Noriyoshi, Iyoda, Tomokazu, Matsui, Shinji (2009) Thermal Nanoimprint of a Polystyrene and Poly(4-vinylpyridine) Double-Layer Thin Film and Visualization Determination of Its Internal Structure by Transmission Electron Microscopy. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fh12

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Reference TypeJournal (article/letter/editorial)
TitleThermal Nanoimprint of a Polystyrene and Poly(4-vinylpyridine) Double-Layer Thin Film and Visualization Determination of Its Internal Structure by Transmission Electron Microscopy
JournalJapanese Journal of Applied Physics
AuthorsNakagawa, MasaruAuthor
Kamata, NoriyoshiAuthor
Iyoda, TomokazuAuthor
Matsui, ShinjiAuthor
Year2009 (June 22)Volume48
Issue6
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.48.06fh12Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15033997Long-form Identifiermindat:1:5:15033997:9
GUID0
Full ReferenceNakagawa, Masaru, Kamata, Noriyoshi, Iyoda, Tomokazu, Matsui, Shinji (2009) Thermal Nanoimprint of a Polystyrene and Poly(4-vinylpyridine) Double-Layer Thin Film and Visualization Determination of Its Internal Structure by Transmission Electron Microscopy. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fh12
Plain TextNakagawa, Masaru, Kamata, Noriyoshi, Iyoda, Tomokazu, Matsui, Shinji (2009) Thermal Nanoimprint of a Polystyrene and Poly(4-vinylpyridine) Double-Layer Thin Film and Visualization Determination of Its Internal Structure by Transmission Electron Microscopy. Japanese Journal of Applied Physics, 48 (6) 6 doi:10.1143/jjap.48.06fh12
In(2009, June) Japanese Journal of Applied Physics Vol. 48 (6) Japan Society of Applied Physics

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Kobayashi, Kei, Sakai, Nobuji, Matsui, Shinji, Nakagawa, Masaru (2010) Fluorescent UV-Curable Resists for UV Nanoimprint Lithography. Japanese Journal of Applied Physics, 49 (6) 6 doi:10.1143/jjap.49.06gl07
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