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Couderc, Sandrine, Blech, Vincent, Kim, Beomjoon (2009) New Surface Treatment and Microscale/Nanoscale Surface Patterning Using Electrostatically Clamped Stencil Mask. Japanese Journal of Applied Physics, 48 (9) 95007 doi:10.1143/jjap.48.095007

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Reference TypeJournal (article/letter/editorial)
TitleNew Surface Treatment and Microscale/Nanoscale Surface Patterning Using Electrostatically Clamped Stencil Mask
JournalJapanese Journal of Applied Physics
AuthorsCouderc, SandrineAuthor
Blech, VincentAuthor
Kim, BeomjoonAuthor
Year2009 (September 24)Volume48
Issue9
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.48.095007Search in ResearchGate
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Mindat Ref. ID15034412Long-form Identifiermindat:1:5:15034412:6
GUID0
Full ReferenceCouderc, Sandrine, Blech, Vincent, Kim, Beomjoon (2009) New Surface Treatment and Microscale/Nanoscale Surface Patterning Using Electrostatically Clamped Stencil Mask. Japanese Journal of Applied Physics, 48 (9) 95007 doi:10.1143/jjap.48.095007
Plain TextCouderc, Sandrine, Blech, Vincent, Kim, Beomjoon (2009) New Surface Treatment and Microscale/Nanoscale Surface Patterning Using Electrostatically Clamped Stencil Mask. Japanese Journal of Applied Physics, 48 (9) 95007 doi:10.1143/jjap.48.095007
In(2009, September) Japanese Journal of Applied Physics Vol. 48 (9) Japan Society of Applied Physics

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