Hamaya, Kohei, Ando, Yuichiro, Sadoh, Taizoh, Miyao, Masanobu (2011) Source–Drain Engineering Using Atomically Controlled Heterojunctions for Next-Generation SiGe Transistor Applications. Japanese Journal of Applied Physics, 50 (1) 10101 doi:10.7567/jjap.50.010101
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Source–Drain Engineering Using Atomically Controlled Heterojunctions for Next-Generation SiGe Transistor Applications | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Hamaya, Kohei | Author | |
Ando, Yuichiro | Author | ||
Sadoh, Taizoh | Author | ||
Miyao, Masanobu | Author | ||
Year | 2011 (January 1) | Volume | 50 |
Issue | 1 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.7567/jjap.50.010101Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15036718 | Long-form Identifier | mindat:1:5:15036718:7 |
GUID | 0 | ||
Full Reference | Hamaya, Kohei, Ando, Yuichiro, Sadoh, Taizoh, Miyao, Masanobu (2011) Source–Drain Engineering Using Atomically Controlled Heterojunctions for Next-Generation SiGe Transistor Applications. Japanese Journal of Applied Physics, 50 (1) 10101 doi:10.7567/jjap.50.010101 | ||
Plain Text | Hamaya, Kohei, Ando, Yuichiro, Sadoh, Taizoh, Miyao, Masanobu (2011) Source–Drain Engineering Using Atomically Controlled Heterojunctions for Next-Generation SiGe Transistor Applications. Japanese Journal of Applied Physics, 50 (1) 10101 doi:10.7567/jjap.50.010101 | ||
In | (2011, January) Japanese Journal of Applied Physics Vol. 50 (1) Japan Society of Applied Physics |
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