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Nakamura, Yoshiaki, Amari, Shogo, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2011) Formation and Magnetic Properties of Ultrahigh Density Fe3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO2Films. Japanese Journal of Applied Physics, 50 (1) 15501 doi:10.7567/jjap.50.015501

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Reference TypeJournal (article/letter/editorial)
TitleFormation and Magnetic Properties of Ultrahigh Density Fe3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO2Films
JournalJapanese Journal of Applied Physics
AuthorsNakamura, YoshiakiAuthor
Amari, ShogoAuthor
Cho, Sung-PyoAuthor
Tanaka, NobuoAuthor
Ichikawa, MasakazuAuthor
Year2011 (January 1)Volume50
Issue1
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.50.015501Search in ResearchGate
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Mindat Ref. ID15036760Long-form Identifiermindat:1:5:15036760:6
GUID0
Full ReferenceNakamura, Yoshiaki, Amari, Shogo, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2011) Formation and Magnetic Properties of Ultrahigh Density Fe3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO2Films. Japanese Journal of Applied Physics, 50 (1) 15501 doi:10.7567/jjap.50.015501
Plain TextNakamura, Yoshiaki, Amari, Shogo, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2011) Formation and Magnetic Properties of Ultrahigh Density Fe3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO2Films. Japanese Journal of Applied Physics, 50 (1) 15501 doi:10.7567/jjap.50.015501
In(2011, January) Japanese Journal of Applied Physics Vol. 50 (1) Japan Society of Applied Physics

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Nakamura, Yoshiaki, Amari, Shogo, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2011) Formation and Magnetic Properties of Ultrahigh Density Fe3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO2Films. Japanese Journal of Applied Physics, 50. 15501 doi:10.1143/jjap.50.015501
Nakamura, Yoshiaki, Nagadomi, Yasushi, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2006) Formation of ultrahigh density and ultrasmall coherent β‐FeSi2 nanodots on Si (111) substrates using Si and Fe codeposition method. Journal of Applied Physics, 100 (4). 44313pp. doi:10.1063/1.2266322
Amari, Shogo, Nakamura, Yoshiaki, Ichikawa, Masakazu (2014) Luminescence properties of Si-capped β-FeSi2 nanodots epitaxially grown on Si(001) and (111) substrates. Journal of Applied Physics, 115 (8). 84306pp. doi:10.1063/1.4867037
Nakamura, Yoshiaki, Masada, Akiko, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2007) Epitaxial growth of ultrahigh density Ge1−xSnx quantum dots on Si (111) substrates by codeposition of Ge and Sn on ultrathin SiO2 films. Journal of Applied Physics, 102 (12). 124302pp. doi:10.1063/1.2822271
Nakamura, Yoshiaki, Nagadomi, Yasushi, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2005) Formation of strained iron silicide nanodots by Fe deposition on Si nanodots on oxidized Si (111) surfaces. Physical Review B, 72 (7) doi:10.1103/physrevb.72.075404
Nakamura, Yoshiaki, Ichikawa, Masakazu (2015) Formation of epitaxial nanodots on Si substrates with controlled interfaces and their application. Japanese Journal of Applied Physics, 54 (7) 7 doi:10.7567/jjap.54.07jd01
Nakamura, Yoshiaki, Suzuki, Ryota, Umeno, Masafumi, Cho, Sung-Pyo, Tanaka, Nobuo, Ichikawa, Masakazu (2006) Observation of the quantum-confinement effect in individual β-FeSi2 nanoislands epitaxially grown on Si (111) surfaces using scanning tunneling spectroscopy. Applied Physics Letters, 89 (12). 123104pp. doi:10.1063/1.2349842
Cho, Sung-Pyo, Nakamura, Yoshiaki, Yamasaki, Jun, Okunishi, Eiji, Ichikawa, Masakazu, Tanaka, Nobuo (2013) Microstructure and interdiffusion behaviour of β-FeSi2 flat islands grown on Si(111) surfaces. Journal of Applied Crystallography, 46 (4). 1076-1080 doi:10.1107/s0021889813015355
Nakamura, Yoshiaki, Sugimoto, Tomohiro, Ichikawa, Masakazu (2009) Formation and optical properties of GaSb quantum dots epitaxially grown on Si substrates using an ultrathin SiO2 film technique. Journal of Applied Physics, 105 (1). 14308pp. doi:10.1063/1.3055211
Nakamura, Yoshiaki, Nagadomi, Yasushi, Sugie, Kaoru, Miyata, Noriyuki, Ichikawa, Masakazu (2004) Formation of ultrahigh density Ge nanodots on oxidized Ge/Si(111) surfaces. Journal of Applied Physics, 95 (9). 5014-5018 doi:10.1063/1.1690863
Nakamura, Yoshiaki, Fujinoki, Norihiko, Ichikawa, Masakazu (2009) Photoluminescence from Si-capped GeSn nanodots on Si substrates formed using an ultrathin SiO2 film technique. Journal of Applied Physics, 106 (1). 14309pp. doi:10.1063/1.3159902
 
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