| Reference Type | Journal (article/letter/editorial) |
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| Title | Correlation between Oxygen Composition and Electrical Properties in NiO Thin Films for Resistive Random Access Memory |
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| Journal | Japanese Journal of Applied Physics |
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| Authors | Nishi, Yusuke | Author |
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| Iwata, Tatsuya | Author |
| Kimoto, Tsunenobu | Author |
| Year | 2011 (January 1) | Volume | 50 |
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| Issue | 1 |
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| Publisher | Japan Society of Applied Physics |
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| DOI | doi:10.7567/jjap.50.015802Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 15036763 | Long-form Identifier | mindat:1:5:15036763:7 |
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| GUID | 0 |
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| Full Reference | Nishi, Yusuke, Iwata, Tatsuya, Kimoto, Tsunenobu (2011) Correlation between Oxygen Composition and Electrical Properties in NiO Thin Films for Resistive Random Access Memory. Japanese Journal of Applied Physics, 50 (1) 15802 doi:10.7567/jjap.50.015802 |
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| Plain Text | Nishi, Yusuke, Iwata, Tatsuya, Kimoto, Tsunenobu (2011) Correlation between Oxygen Composition and Electrical Properties in NiO Thin Films for Resistive Random Access Memory. Japanese Journal of Applied Physics, 50 (1) 15802 doi:10.7567/jjap.50.015802 |
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| In | (2011, January) Japanese Journal of Applied Physics Vol. 50 (1) Japan Society of Applied Physics |
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