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Geng, Huiyuan, Yamaguchi, A Atsushi, Sunakawa, Haruo, Sumi, Norihiko, Yamamoto, Kazutomi, Usui, Akira (2011) Residual Strain Evaluation by Cross-Sectional Micro-Reflectance Spectroscopy of Freestanding GaN Grown by Hydride Vapor Phase Epitaxy. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01ac01

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Reference TypeJournal (article/letter/editorial)
TitleResidual Strain Evaluation by Cross-Sectional Micro-Reflectance Spectroscopy of Freestanding GaN Grown by Hydride Vapor Phase Epitaxy
JournalJapanese Journal of Applied Physics
AuthorsGeng, HuiyuanAuthor
Yamaguchi, A AtsushiAuthor
Sunakawa, HaruoAuthor
Sumi, NorihikoAuthor
Yamamoto, KazutomiAuthor
Usui, AkiraAuthor
Year2011 (January 1)Volume50
Issue1
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.50.01ac01Search in ResearchGate
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Mindat Ref. ID15036791Long-form Identifiermindat:1:5:15036791:0
GUID0
Full ReferenceGeng, Huiyuan, Yamaguchi, A Atsushi, Sunakawa, Haruo, Sumi, Norihiko, Yamamoto, Kazutomi, Usui, Akira (2011) Residual Strain Evaluation by Cross-Sectional Micro-Reflectance Spectroscopy of Freestanding GaN Grown by Hydride Vapor Phase Epitaxy. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01ac01
Plain TextGeng, Huiyuan, Yamaguchi, A Atsushi, Sunakawa, Haruo, Sumi, Norihiko, Yamamoto, Kazutomi, Usui, Akira (2011) Residual Strain Evaluation by Cross-Sectional Micro-Reflectance Spectroscopy of Freestanding GaN Grown by Hydride Vapor Phase Epitaxy. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01ac01
In(2011, January) Japanese Journal of Applied Physics Vol. 50 (1) Japan Society of Applied Physics


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