Yagi, Takashi, Oka, Nobuto, Okabe, Takashi, Taketoshi, Naoyuki, Baba, Tetsuya, Shigesato, Yuzo (2011) Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.1143/jjap.50.11rb01
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Yagi, Takashi | Author | |
Oka, Nobuto | Author | ||
Okabe, Takashi | Author | ||
Taketoshi, Naoyuki | Author | ||
Baba, Tetsuya | Author | ||
Shigesato, Yuzo | Author | ||
Year | 2011 (November 21) | Volume | 50 |
Issue | 11 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.50.11rb01Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15037151 | Long-form Identifier | mindat:1:5:15037151:1 |
GUID | 0 | ||
Full Reference | Yagi, Takashi, Oka, Nobuto, Okabe, Takashi, Taketoshi, Naoyuki, Baba, Tetsuya, Shigesato, Yuzo (2011) Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.1143/jjap.50.11rb01 | ||
Plain Text | Yagi, Takashi, Oka, Nobuto, Okabe, Takashi, Taketoshi, Naoyuki, Baba, Tetsuya, Shigesato, Yuzo (2011) Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.1143/jjap.50.11rb01 | ||
In | (2011, November) Japanese Journal of Applied Physics Vol. 50 (11) Japan Society of Applied Physics |
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