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Yagi, Takashi, Oka, Nobuto, Okabe, Takashi, Taketoshi, Naoyuki, Baba, Tetsuya, Shigesato, Yuzo (2011) Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.1143/jjap.50.11rb01

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Reference TypeJournal (article/letter/editorial)
TitleEffect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering
JournalJapanese Journal of Applied Physics
AuthorsYagi, TakashiAuthor
Oka, NobutoAuthor
Okabe, TakashiAuthor
Taketoshi, NaoyukiAuthor
Baba, TetsuyaAuthor
Shigesato, YuzoAuthor
Year2011 (November 21)Volume50
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.50.11rb01Search in ResearchGate
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Mindat Ref. ID15037151Long-form Identifiermindat:1:5:15037151:1
GUID0
Full ReferenceYagi, Takashi, Oka, Nobuto, Okabe, Takashi, Taketoshi, Naoyuki, Baba, Tetsuya, Shigesato, Yuzo (2011) Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.1143/jjap.50.11rb01
Plain TextYagi, Takashi, Oka, Nobuto, Okabe, Takashi, Taketoshi, Naoyuki, Baba, Tetsuya, Shigesato, Yuzo (2011) Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (11) 11 doi:10.1143/jjap.50.11rb01
In(2011, November) Japanese Journal of Applied Physics Vol. 50 (11) Japan Society of Applied Physics


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