Lee, Dong Uk, Lee, Hyo Jun, Kim, Eun Kyu, You, Hee-Wook, Cho, Won-Ju (2012) Speed Enhancement of WSi$_{2}$ Nanocrystal Memory with Barrier-Engineered Si$_{3}$N$_{4}$/HfAlO Tunnel Layer. Japanese Journal of Applied Physics, 51. 6 doi:10.1143/jjap.51.06fe13
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Speed Enhancement of WSi$_{2}$ Nanocrystal Memory with Barrier-Engineered Si$_{3}$N$_{4}$/HfAlO Tunnel Layer | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Lee, Dong Uk | Author | |
| Lee, Hyo Jun | Author | ||
| Kim, Eun Kyu | Author | ||
| You, Hee-Wook | Author | ||
| Cho, Won-Ju | Author | ||
| Year | 2012 (June 20) | Volume | 51 |
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.51.06fe13Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15040417 | Long-form Identifier | mindat:1:5:15040417:2 |
| GUID | 0 | ||
| Full Reference | Lee, Dong Uk, Lee, Hyo Jun, Kim, Eun Kyu, You, Hee-Wook, Cho, Won-Ju (2012) Speed Enhancement of WSi$_{2}$ Nanocrystal Memory with Barrier-Engineered Si$_{3}$N$_{4}$/HfAlO Tunnel Layer. Japanese Journal of Applied Physics, 51. 6 doi:10.1143/jjap.51.06fe13 | ||
| Plain Text | Lee, Dong Uk, Lee, Hyo Jun, Kim, Eun Kyu, You, Hee-Wook, Cho, Won-Ju (2012) Speed Enhancement of WSi$_{2}$ Nanocrystal Memory with Barrier-Engineered Si$_{3}$N$_{4}$/HfAlO Tunnel Layer. Japanese Journal of Applied Physics, 51. 6 doi:10.1143/jjap.51.06fe13 | ||
| In | (2012) Japanese Journal of Applied Physics Vol. 51. Japan Society of Applied Physics | ||
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