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Suzuki, Minoru, Katsui, Hiromitsu (2012) Method for Measuring Anisotropic Electrical Resistivity. Japanese Journal of Applied Physics, 51. 123102 doi:10.1143/jjap.51.123102

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Reference TypeJournal (article/letter/editorial)
TitleMethod for Measuring Anisotropic Electrical Resistivity
JournalJapanese Journal of Applied Physics
AuthorsSuzuki, MinoruAuthor
Katsui, HiromitsuAuthor
Year2012 (November 20)Volume51
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.51.123102Search in ResearchGate
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Mindat Ref. ID15041347Long-form Identifiermindat:1:5:15041347:1
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Full ReferenceSuzuki, Minoru, Katsui, Hiromitsu (2012) Method for Measuring Anisotropic Electrical Resistivity. Japanese Journal of Applied Physics, 51. 123102 doi:10.1143/jjap.51.123102
Plain TextSuzuki, Minoru, Katsui, Hiromitsu (2012) Method for Measuring Anisotropic Electrical Resistivity. Japanese Journal of Applied Physics, 51. 123102 doi:10.1143/jjap.51.123102
In(2012) Japanese Journal of Applied Physics Vol. 51. Japan Society of Applied Physics

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Suzuki, Minoru, Katsui, Hiromitsu (2012) Method for Measuring Anisotropic Electrical Resistivity. Japanese Journal of Applied Physics, 51 (12) 123102 doi:10.7567/jjap.51.123102
Katsui, Akinori, Suzuki, Minoru (1982) Single Crystal Growth of Ba(Pb, Bi)O3from Molten KCl Solvent. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l157
Suzuki, Takeomi (1978) A Method for Measuring High Reflectivity. Japanese Journal of Applied Physics, 17 (5) 929-935 doi:10.1143/jjap.17.929
Miyashita, Masanori, Kawai, Shinji, Masuda, Atsushi (2012) Measuring Method of Moisture Ingress into Photovoltaic Modules. Japanese Journal of Applied Physics, 51. 10 doi:10.1143/jjap.51.10nf12
Hidaka, Yoshikazu, Enomoto, Youichi, Suzuki, Minoru, Oda, Migaku, Katsui, Akinori, Murakami, Toshiaki (1987) Anisotropy of the Upper Critical Magnetic Field in Single Crystal YBa2Cu3O7+y. Japanese Journal of Applied Physics, 26. doi:10.1143/jjap.26.l726
Amemiya, Hiroshi, Suzuki, Takanori (1991) Laser-Assisted Probing Method for Measuring Negative Ions in Plasmas. Japanese Journal of Applied Physics, 30. doi:10.1143/jjap.30.l1895
Ohuchi, Kazuya, Lavoie, Christian, Yang, Bin, Kondo, Masaki, Matsuzawa, Kazuya, Solomon, Paul M. (2012) Accurate Method of Measuring Specific Contact Resistivity of Interface between Silicide and Silicon and Its Application. Japanese Journal of Applied Physics, 51. 101302 doi:10.1143/jjap.51.101302
Kato, Hiromitsu, Makino, Toshiharu, Ogura, Masahiko, Takeuchi, Daisuke, Yamasaki, Satoshi (2012) Maskless Selective Growth Method for p–n Junction Applications on (001)-Oriented Diamond. Japanese Journal of Applied Physics, 51. 90118 doi:10.1143/jjap.51.090118
Munakata, Chusuke (1967) An Electron Beam Method of Measuring Resistivity Distribution in Semiconductors. Japanese Journal of Applied Physics, 6 (8) 963-971 doi:10.1143/jjap.6.963
Montgomery, H. C. (1971) Method for Measuring Electrical Resistivity of Anisotropic Materials. Journal of Applied Physics, 42 (7). 2971-2975 doi:10.1063/1.1660656
Mori, Hideo, Suminokura, Toshihiko, Suzuki, Tatsuro (1968) Interferometric Method for Measuring Ultrasonic Light Diffraction Spectra. Japanese Journal of Applied Physics, 7 (12) 1518-1522 doi:10.1143/jjap.7.1518
 
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