Kumagai, Shinya, Hikita, Akiyoshi, Iwamoto, Takuya, Tomikawa, Takashi, Hori, Masaru, Sasaki, Minoru (2012) Multiple-Height Microstructure Fabricated by Deep Reactive Ion Etching and Selective Ashing of Resist Layer Combined with Ultraviolet Curing. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ab04
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Multiple-Height Microstructure Fabricated by Deep Reactive Ion Etching and Selective Ashing of Resist Layer Combined with Ultraviolet Curing | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Kumagai, Shinya | Author | |
| Hikita, Akiyoshi | Author | ||
| Iwamoto, Takuya | Author | ||
| Tomikawa, Takashi | Author | ||
| Hori, Masaru | Author | ||
| Sasaki, Minoru | Author | ||
| Year | 2012 (January 20) | Volume | 51 |
| Issue | 1 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.51.01ab04Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15041458 | Long-form Identifier | mindat:1:5:15041458:4 |
| GUID | 0 | ||
| Full Reference | Kumagai, Shinya, Hikita, Akiyoshi, Iwamoto, Takuya, Tomikawa, Takashi, Hori, Masaru, Sasaki, Minoru (2012) Multiple-Height Microstructure Fabricated by Deep Reactive Ion Etching and Selective Ashing of Resist Layer Combined with Ultraviolet Curing. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ab04 | ||
| Plain Text | Kumagai, Shinya, Hikita, Akiyoshi, Iwamoto, Takuya, Tomikawa, Takashi, Hori, Masaru, Sasaki, Minoru (2012) Multiple-Height Microstructure Fabricated by Deep Reactive Ion Etching and Selective Ashing of Resist Layer Combined with Ultraviolet Curing. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ab04 | ||
| In | (2012, January) Japanese Journal of Applied Physics Vol. 51 (1) Japan Society of Applied Physics | ||
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